(Zr,Ti,O) alloy films with enhanced hardness and resistance to cracking prepared by magnetron sputtering

J. Musil, S. Zenkin, R. Čerstvý, S. Haviar, Z. Čiperová

Результат исследований: Материалы для журналаСтатья

5 Цитирования (Scopus)

Выдержка

The article reports on the effect of (i) the ion bombardment and (ii) the addition of small amount of oxygen into Ar sputtering gas on the structure, microstructure, mechanical properties and macrostress of the (Zr,Ti) alloy films prepared by DC magnetron sputtering. Properties of the (Zr,Ti) alloy films with three different elemental compositions – (1) Zr95Ti5, (2) Zr30Ti70 and (3) Zr5Ti95 were investigated in detail. It was found that (1) the (Zr,Ti) alloy films sputtered at a low value of the negative substrate bias Us = − 50 V are well crystalline, (2) the (Zr,Ti) alloy films sputtered at high values of the negative substrate bias

Язык оригиналаАнглийский
Страницы (с-по)86-91
Число страниц6
ЖурналSurface and Coatings Technology
Том322
DOI
СостояниеОпубликовано - 15 авг 2017

Отпечаток

Magnetron sputtering
magnetron sputtering
hardness
Hardness
Substrates
Ion bombardment
Sputtering
bombardment
Gases
sputtering
direct current
mechanical properties
Oxygen
Crystalline materials
Mechanical properties
microstructure
Microstructure
Ti-Zr alloy
oxygen
Chemical analysis

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Цитировать

(Zr,Ti,O) alloy films with enhanced hardness and resistance to cracking prepared by magnetron sputtering. / Musil, J.; Zenkin, S.; Čerstvý, R.; Haviar, S.; Čiperová, Z.

В: Surface and Coatings Technology, Том 322, 15.08.2017, стр. 86-91.

Результат исследований: Материалы для журналаСтатья

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abstract = "The article reports on the effect of (i) the ion bombardment and (ii) the addition of small amount of oxygen into Ar sputtering gas on the structure, microstructure, mechanical properties and macrostress of the (Zr,Ti) alloy films prepared by DC magnetron sputtering. Properties of the (Zr,Ti) alloy films with three different elemental compositions – (1) Zr95Ti5, (2) Zr30Ti70 and (3) Zr5Ti95 were investigated in detail. It was found that (1) the (Zr,Ti) alloy films sputtered at a low value of the negative substrate bias Us = − 50 V are well crystalline, (2) the (Zr,Ti) alloy films sputtered at high values of the negative substrate bias",
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AU - Musil, J.

AU - Zenkin, S.

AU - Čerstvý, R.

AU - Haviar, S.

AU - Čiperová, Z.

PY - 2017/8/15

Y1 - 2017/8/15

N2 - The article reports on the effect of (i) the ion bombardment and (ii) the addition of small amount of oxygen into Ar sputtering gas on the structure, microstructure, mechanical properties and macrostress of the (Zr,Ti) alloy films prepared by DC magnetron sputtering. Properties of the (Zr,Ti) alloy films with three different elemental compositions – (1) Zr95Ti5, (2) Zr30Ti70 and (3) Zr5Ti95 were investigated in detail. It was found that (1) the (Zr,Ti) alloy films sputtered at a low value of the negative substrate bias Us = − 50 V are well crystalline, (2) the (Zr,Ti) alloy films sputtered at high values of the negative substrate bias

AB - The article reports on the effect of (i) the ion bombardment and (ii) the addition of small amount of oxygen into Ar sputtering gas on the structure, microstructure, mechanical properties and macrostress of the (Zr,Ti) alloy films prepared by DC magnetron sputtering. Properties of the (Zr,Ti) alloy films with three different elemental compositions – (1) Zr95Ti5, (2) Zr30Ti70 and (3) Zr5Ti95 were investigated in detail. It was found that (1) the (Zr,Ti) alloy films sputtered at a low value of the negative substrate bias Us = − 50 V are well crystalline, (2) the (Zr,Ti) alloy films sputtered at high values of the negative substrate bias

KW - (Zr,Ti) alloy films

KW - (Zr,Ti,O) alloy films

KW - Mechanical properties

KW - Microstructure

KW - Resistance to cracking

KW - Structure

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