Very broad metal ion beam source for ion implantation and coating deposition technologies

Результат исследования: Материалы для книги/типы отчетовМатериалы для конференции

Аннотация

The paper describes high broad metal ion source based on DC macroparticle filtered vacuum arc plasma generation with the DC and repetitively pulsed ion-beam extraction. This ion source can produce the metal ion beams of 0.60 m length with pulsed ion beam current up to 1.5 A at repetitively pulsed accelerating voltage of 20-40 kV and 0.2 A at 40 kV DC accelerating voltage. Results of the study of ion emission properties of high broad vacuum - arc evaporator are presented. The influence of magnetic field strength near the cathode surface on the arc spot movement and ionemission properties of vacuum-arc discharge for different cathode materials are investigated. It was shown that vacuum-arc discharge stability can be reached when the magnetic field strength ranges from 40 to 70 G on the cathode surface.

Язык оригиналаАнглийский
Заголовок главной публикацииAdvanced Materials, Synthesis, Development and Application
Страницы288-291
Количество страниц4
DOI
Статус публикацииОпубликовано - 20 фев 2014
Событие10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013 - Tomsk, Российская Федерация
Длительность: 23 апр 201326 апр 2013

Серии публикаций

Имя, фамилияAdvanced Materials Research
Том880
ISSN (печатная версия)1022-6680

Другое

Другое10th International Conference on Prospects of Fundamental Sciences Development, PFSD-2013
СтранаРоссийская Федерация
ГородTomsk
Период23.4.1326.4.13

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ASJC Scopus subject areas

  • Engineering(all)

Цитировать

Stepanov, I., Ryabchikov, A., & Sivin, D. O. (2014). Very broad metal ion beam source for ion implantation and coating deposition technologies. В Advanced Materials, Synthesis, Development and Application (стр. 288-291). (Advanced Materials Research; Том 880). https://doi.org/10.4028/www.scientific.net/AMR.880.288