Vacuum arc ion and plasma source Raduga-5. Technological applications

Аннотация

The paper discusses examples of realizing the regimes of high-intensity and high-concentration ion implantation, and plasma deposition of coatings including the conditions of dynamic ion mixing using "Raduga-5", a source of accelerated ions and plasma based on the DC vacuum arc discharge. It is shown that when a target is treated with high average power beams, it is possible to dope a material at depths exceeding the projective ion range by an order of magnitude. Features of ion beam application at different stages of ion plasma deposition of coatings are considered. Examples are given for the formation of wide transition layers between the coating and the substrate under conditions of intensive ion mixing. Mechanisms of change in the properties of the coatings formed with decreasing microparticle fractions in the arc plasma stream are considered.

Язык оригинала	Английский
Название основной публикации	5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001
Издатель	Institute of Electrical and Electronics Engineers Inc.
Страницы	380-383
Число страниц	4
Том	1
ISBN (печатное издание)	0780370082, 9780780370081
DOI	https://doi.org/10.1109/KORUS.2001.975158
Состояние	Опубликовано - 2001
Событие	5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 - Tomsk, Российская Федерация Продолжительность: 26 июн 2001 → 3 июл 2001

Другое

Другое	5th Korea-Russia International Symposium on Science and Technology, KORUS 2001
Страна	Российская Федерация
Город	Tomsk
Период	26.6.01 → 3.7.01

ASJC Scopus subject areas

Clinical Biochemistry
Computer Networks and Communications
Biotechnology
Civil and Structural Engineering
Mechanics of Materials
Electronic, Optical and Magnetic Materials
Materials Chemistry
Surfaces, Coatings and Films

Доступ к документу

10.1109/KORUS.2001.975158

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Цитировать

Ryabchikov, A. I., Stepanov, I. B., Dektyarev, S. V., Shulepov, I. A., Lukonin, E. I., & Sivin, D. O. (2001). Vacuum arc ion and plasma source Raduga-5. Technological applications. В 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001 (Том 1, стр. 380-383). [975158] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/KORUS.2001.975158

Vacuum arc ion and plasma source Raduga-5. Technological applications. / Ryabchikov, A. I.; Stepanov, I. B.; Dektyarev, S. V.; Shulepov, I. A.; Lukonin, E. I.; Sivin, D. O.

5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Том 1 Institute of Electrical and Electronics Engineers Inc., 2001. стр. 380-383 975158.

Результат исследований: Материалы для книги/типы отчетов › Материалы для конференции

Ryabchikov, AI , Stepanov, IB , Dektyarev, SV, Shulepov, IA, Lukonin, EI & Sivin, DO 2001, Vacuum arc ion and plasma source Raduga-5. Technological applications. в 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. том. 1, 975158, Institute of Electrical and Electronics Engineers Inc., стр. 380-383, 5th Korea-Russia International Symposium on Science and Technology, KORUS 2001, Tomsk, Российская Федерация, 26.6.01. https://doi.org/10.1109/KORUS.2001.975158

Ryabchikov AI , Stepanov IB , Dektyarev SV, Shulepov IA, Lukonin EI, Sivin DO. Vacuum arc ion and plasma source Raduga-5. Technological applications. В 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Том 1. Institute of Electrical and Electronics Engineers Inc. 2001. стр. 380-383. 975158 https://doi.org/10.1109/KORUS.2001.975158

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