Use of a thin liquid film moving under the action of gas flow in a mini-channel for removing high heat fluxes

Dmitry Zaitsev, Egor Tkachenko, Evgeniy Orlik, Oleg Kabov

Результат исследований: Материалы для журналаСтатья

6 Цитирования (Scopus)

Аннотация

Intensively evaporating liquid films shear-driven in a mini- or micro-channel under the action of cocurrent gas flow are promising for the use in modern cooling systems of semiconductor devices. In this work, we investigated the influence of liquid and gas flow rates on the critical heat flux in a locally heated film of water, moving under the action of air flow in a mini-channel. In experiments a record value of critical heat flux of 870 W/cm2 was reached. Heat spreading into the substrate and heat losses to the atmosphere in total do not exceed 25 % at heat fluxes above 400 W/cm2. A comparison with the critical heat flux for water flow boiling in the channel shows that, for shear-driven liquid films the critical heat flux is almost an order of magnitude higher.

Язык оригиналаАнглийский
Номер статьи01037
ЖурналMATEC Web of Conferences
Том92
DOI
СостояниеОпубликовано - 21 дек 2016
Опубликовано для внешнего пользованияДа
Событие2016 Thermophysical Basis of Energy Technologies, TBET 2016 - Tomsk, Российская Федерация
Продолжительность: 26 окт 201628 окт 2016

ASJC Scopus subject areas

  • Chemistry(all)
  • Engineering(all)
  • Materials Science(all)

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