Titanium oxynitride thin films deposited by the reactive magnetron sputtering: Structure and physical-mechanical properties

N. Morozova, Maxim Evgenievich Konishchev, Alla Alexandrovna Pustovalova, Yu Bykova, I. Grebneva, O. Kuzmin, V. Pichugin

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

3 Цитирования (Scopus)

Аннотация

The physical-mechanical properties of titanium oxides and oxynitride films synthesized by pulsed magnetron reactive sputtering deposition technique were investigated. Optical emission spectroscopy was used to characterize magnetron plasma and determine an appropriate regime of films deposition. The structure and surface chemical and physical properties of the films were characterized by X-ray diffraction, Auger electron spectroscopy, atomic force microscopy (AFM). Mechanical characteristics of obtained films which include their roughness, nano-hardness (H) and Young's modulus (E) were studied.

Язык оригиналаАнглийский
Название основной публикацииProceedings - 2012 7th International Forum on Strategic Technology, IFOST 2012
DOI
СостояниеОпубликовано - 2012
Событие2012 7th International Forum on Strategic Technology, IFOST 2012 - Tomsk, Российская Федерация
Продолжительность: 18 сен 201221 сен 2012

Другое

Другое2012 7th International Forum on Strategic Technology, IFOST 2012
СтранаРоссийская Федерация
ГородTomsk
Период18.9.1221.9.12

ASJC Scopus subject areas

  • Management of Technology and Innovation

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