Titanium macroparticles density decreasing on the sample, immersed in plasma, at repetitively pulsed biasing

Аннотация

We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f = 10⁵ p.p.s., φ_b = -2 kV and τ = 7 μs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.

Язык оригинала	Английский
Страницы (с-по)	126-129
Число страниц	4
Журнал	Applied Surface Science
Том	310
DOI	https://doi.org/10.1016/j.apsusc.2014.03.128
Состояние	Опубликовано - 15 авг 2014

ASJC Scopus subject areas

Surfaces, Coatings and Films

Доступ к документу

10.1016/j.apsusc.2014.03.128

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Цитировать

Sivin, D. O., Ryabchikov, A. I., Bumagina, A. I., Tupikova, O. S., & Daneikina, N. V. (2014). Titanium macroparticles density decreasing on the sample, immersed in plasma, at repetitively pulsed biasing. Applied Surface Science, 310, 126-129. https://doi.org/10.1016/j.apsusc.2014.03.128

Titanium macroparticles density decreasing on the sample, immersed in plasma, at repetitively pulsed biasing. / Sivin, Denis Olegovich ; Ryabchikov, A. I.; Bumagina, A. I.; Tupikova, Olga Sergeevna; Daneikina, N. V.

В: Applied Surface Science, Том 310, 15.08.2014, стр. 126-129.

Результат исследований: Материалы для журнала › Статья

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abstract = "We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f = 105 p.p.s., φb = -2 kV and τ = 7 μs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.",

keywords = "Macroparticles, Metal plasma, Negative high-frequency short-pulsed bias, Plasma immersion ion implantation, Vacuum-arc",

author = "Sivin, {Denis Olegovich} and Ryabchikov, {A. I.} and Bumagina, {A. I.} and Tupikova, {Olga Sergeevna} and Daneikina, {N. V.}",

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AU - Sivin, Denis Olegovich

AU - Ryabchikov, A. I.

AU - Bumagina, A. I.

AU - Tupikova, Olga Sergeevna

AU - Daneikina, N. V.

PY - 2014/8/15

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AB - We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f = 105 p.p.s., φb = -2 kV and τ = 7 μs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.

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KW - Plasma immersion ion implantation

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