Thickness dependent wetting properties and surface free energy of HfO2 thin films

Sergei Zenkin, Alexandr Belosludtsev, Šimon Kos, Radomír Čerstvý, Stanislav Haviar, Marie Netrvalová

Результат исследований: Материалы для журналаСтатья

20 Цитирования (Scopus)

Аннотация

We show here that intrinsic hydrophobicity of HfO2 thin films can be easily tuned by the variation of film thickness. We used the reactive high-power impulse magnetron sputtering for preparation of high-quality HfO2 films with smooth topography and well-controlled thickness. Results show a strong dependence of wetting properties on the thickness of the film in the range of 50-250 nm due to the dominance of the electrostatic Lifshitz-van der Waals component of the surface free energy. We have found the water droplet contact angle ranging from ≈120° for the thickness of 50 nm to ≈100° for the thickness of 2300 nm. At the same time the surface free energy grows from ≈25 mJ/m2 for the thickness of 50 nm to ≈33 mJ/m2 for the thickness of 2300 nm. We propose two explanations for the observed thickness dependence of the wetting properties: influence of the non-dominant texture and/or non-monotonic size dependence of the particle surface energy.

Язык оригиналаАнглийский
Номер статьи231602
ЖурналApplied Physics Letters
Том108
Номер выпуска23
DOI
СостояниеОпубликовано - 6 июн 2016
Опубликовано для внешнего пользованияДа

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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  • Цитировать

    Zenkin, S., Belosludtsev, A., Kos, Š., Čerstvý, R., Haviar, S., & Netrvalová, M. (2016). Thickness dependent wetting properties and surface free energy of HfO2 thin films. Applied Physics Letters, 108(23), [231602]. https://doi.org/10.1063/1.4953262