The reactive deposition of TiOx thin films

Результат исследования: Материалы для книги/типы отчетовМатериалы для конференции

3 Цитирования (Scopus)


The article reports on the aspects of reactive deposition ultra-thin TiOx films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O2) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O2 flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O2) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (λ=632.8 nm) methods, have strong dependence on Q(O2).

Язык оригиналаАнглийский
Заголовок главной публикацииAdvanced Materials Research
ИздательTrans Tech Publications Ltd
Количество страниц5
ISBN (печатная версия)9783038352648
Статус публикацииОпубликовано - 2014
СобытиеInternational Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 - Tomsk, Российская Федерация
Длительность: 26 мар 201428 мар 2014

Серии публикаций

Имя, фамилияAdvanced Materials Research
ISSN (печатная версия)10226680
ISSN (электронная версия)16628985


ДругоеInternational Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014
СтранаРоссийская Федерация


ASJC Scopus subject areas

  • Engineering(all)


Sidelev, D. V., & Yurjev, Y. N. (2014). The reactive deposition of TiOx thin films. В Advanced Materials Research (Том 1040, стр. 748-752). (Advanced Materials Research; Том 1040). Trans Tech Publications Ltd.