The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering

Dmitrii V. Sidelev, Yury N. Yurjev, Valery Pavlovich Krivobokov, Evgenii V. Erofeev, Olga V. Penkova, Vadim A. Novikov

Результат исследований: Материалы для журналаСтатья

5 Цитирования (Scopus)

Выдержка

This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.

Язык оригиналаАнглийский
Страницы (с-по)29-32
Число страниц4
ЖурналVacuum
Том134
DOI
СостояниеОпубликовано - 1 дек 2016

Отпечаток

Magnetron sputtering
magnetron sputtering
magnetic field configurations
Oxygen
oxygen
Magnetic fields
Optical band gaps
Film growth
Ion bombardment
Densification
Titanium dioxide
densification
Sputtering
anatase
rutile
Mirrors
bombardment
sputtering
Coatings
Atoms

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Цитировать

The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering. / Sidelev, Dmitrii V.; Yurjev, Yury N.; Krivobokov, Valery Pavlovich; Erofeev, Evgenii V.; Penkova, Olga V.; Novikov, Vadim A.

В: Vacuum, Том 134, 01.12.2016, стр. 29-32.

Результат исследований: Материалы для журналаСтатья

Sidelev, Dmitrii V. ; Yurjev, Yury N. ; Krivobokov, Valery Pavlovich ; Erofeev, Evgenii V. ; Penkova, Olga V. ; Novikov, Vadim A. / The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering. В: Vacuum. 2016 ; Том 134. стр. 29-32.
@article{dc184223dd6d4a4c8ce049e4dcf3d96d,
title = "The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering",
abstract = "This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.",
keywords = "Dioxide titanium, Dual magnetron sputtering, Optical properties, Photocatalytic activity, Thin films",
author = "Sidelev, {Dmitrii V.} and Yurjev, {Yury N.} and Krivobokov, {Valery Pavlovich} and Erofeev, {Evgenii V.} and Penkova, {Olga V.} and Novikov, {Vadim A.}",
year = "2016",
month = "12",
day = "1",
doi = "10.1016/j.vacuum.2016.09.007",
language = "English",
volume = "134",
pages = "29--32",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Limited",

}

TY - JOUR

T1 - The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering

AU - Sidelev, Dmitrii V.

AU - Yurjev, Yury N.

AU - Krivobokov, Valery Pavlovich

AU - Erofeev, Evgenii V.

AU - Penkova, Olga V.

AU - Novikov, Vadim A.

PY - 2016/12/1

Y1 - 2016/12/1

N2 - This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.

AB - This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials.

KW - Dioxide titanium

KW - Dual magnetron sputtering

KW - Optical properties

KW - Photocatalytic activity

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=84988037006&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84988037006&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2016.09.007

DO - 10.1016/j.vacuum.2016.09.007

M3 - Article

AN - SCOPUS:84988037006

VL - 134

SP - 29

EP - 32

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -