Polycrystalline diamond films were fabricated on copper substrates by a multi-step process comprised of physical vapor deposition of Al-based composite interlayer on Cu substrate and depositing continuous diamond film on composite interlayer by plasma assisted chemical vapor deposition (PACVD). The interface characteristics and adhesion strength were investigated by Auger electron spectroscopy, Raman analysis, calotest and indentation test. The results show that the continuous film without cracks is successfully obtained. The improved adhesion between diamond film and substrate results from the low residual stress in the film due to their compensation by Al interlayer in the sample cooling process.

Язык оригиналаАнглийский
Артикульный номер012102
ЖурналJournal of Physics: Conference Series
Номер выпуска1
Статус публикацииОпубликовано - 4 мая 2017


ASJC Scopus subject areas

  • Physics and Astronomy(all)