The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode

A. S. Grenadyorov, K. V. Oskomov, A. A. Solovyev, S. V. Rabotkin, N. F. Kovsharov

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Выдержка

Silicon-carbon coatings on silicon substrates were deposited in plasma based nonselfsustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa.

Язык оригиналаАнглийский
Название основной публикацииHigh Technology
Подзаголовок основной публикацииResearch and Applications, 2015
ИздательTrans Tech Publications Ltd
Страницы643-647
Число страниц5
ISBN (печатное издание)9783038357087
DOI
СостояниеОпубликовано - 1 янв 2016
Событие4th International Conference for Young Scientists High Technology: Research and Applications, HTRA 2015 - Tomsk, Российская Федерация
Продолжительность: 21 апр 201524 апр 2015

Серия публикаций

НазваниеKey Engineering Materials
Том685
ISSN (печатное издание)1013-9826

Конференция

Конференция4th International Conference for Young Scientists High Technology: Research and Applications, HTRA 2015
СтранаРоссийская Федерация
ГородTomsk
Период21.4.1524.4.15

Отпечаток

Silicon
Cathodes
Carbon
Plasmas
Coatings
Elastic moduli
Hardness
Plasma polymerization
Argon
Carbon films
Substrates
Bias voltage
Surface morphology
Surface roughness
Flow rate
Electric potential

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Цитировать

Grenadyorov, A. S., Oskomov, K. V., Solovyev, A. A., Rabotkin, S. V., & Kovsharov, N. F. (2016). The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode. В High Technology: Research and Applications, 2015 (стр. 643-647). (Key Engineering Materials; Том 685). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/KEM.685.643

The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode. / Grenadyorov, A. S.; Oskomov, K. V.; Solovyev, A. A.; Rabotkin, S. V.; Kovsharov, N. F.

High Technology: Research and Applications, 2015. Trans Tech Publications Ltd, 2016. стр. 643-647 (Key Engineering Materials; Том 685).

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Grenadyorov, AS, Oskomov, KV, Solovyev, AA, Rabotkin, SV & Kovsharov, NF 2016, The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode. в High Technology: Research and Applications, 2015. Key Engineering Materials, том. 685, Trans Tech Publications Ltd, стр. 643-647, 4th International Conference for Young Scientists High Technology: Research and Applications, HTRA 2015, Tomsk, Российская Федерация, 21.4.15. https://doi.org/10.4028/www.scientific.net/KEM.685.643
Grenadyorov AS, Oskomov KV, Solovyev AA, Rabotkin SV, Kovsharov NF. The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode. В High Technology: Research and Applications, 2015. Trans Tech Publications Ltd. 2016. стр. 643-647. (Key Engineering Materials). https://doi.org/10.4028/www.scientific.net/KEM.685.643
Grenadyorov, A. S. ; Oskomov, K. V. ; Solovyev, A. A. ; Rabotkin, S. V. ; Kovsharov, N. F. / The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode. High Technology: Research and Applications, 2015. Trans Tech Publications Ltd, 2016. стр. 643-647 (Key Engineering Materials).
@inproceedings{de8f4056b53541c2ba56663e577c132e,
title = "The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode",
abstract = "Silicon-carbon coatings on silicon substrates were deposited in plasma based nonselfsustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa.",
keywords = "Diamond-like carbon, Polyphenyl methylsiloxane, Silicon-carbon films",
author = "Grenadyorov, {A. S.} and Oskomov, {K. V.} and Solovyev, {A. A.} and Rabotkin, {S. V.} and Kovsharov, {N. F.}",
year = "2016",
month = "1",
day = "1",
doi = "10.4028/www.scientific.net/KEM.685.643",
language = "English",
isbn = "9783038357087",
series = "Key Engineering Materials",
publisher = "Trans Tech Publications Ltd",
pages = "643--647",
booktitle = "High Technology",

}

TY - GEN

T1 - The deposition of silicon-carbon coatings in plasma based nonself-sustained arc discharge with heated cathode

AU - Grenadyorov, A. S.

AU - Oskomov, K. V.

AU - Solovyev, A. A.

AU - Rabotkin, S. V.

AU - Kovsharov, N. F.

PY - 2016/1/1

Y1 - 2016/1/1

N2 - Silicon-carbon coatings on silicon substrates were deposited in plasma based nonselfsustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa.

AB - Silicon-carbon coatings on silicon substrates were deposited in plasma based nonselfsustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa.

KW - Diamond-like carbon

KW - Polyphenyl methylsiloxane

KW - Silicon-carbon films

UR - http://www.scopus.com/inward/record.url?scp=84958212155&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84958212155&partnerID=8YFLogxK

U2 - 10.4028/www.scientific.net/KEM.685.643

DO - 10.4028/www.scientific.net/KEM.685.643

M3 - Conference contribution

AN - SCOPUS:84958212155

SN - 9783038357087

T3 - Key Engineering Materials

SP - 643

EP - 647

BT - High Technology

PB - Trans Tech Publications Ltd

ER -