Surface chemistry of plasma deposited ZrC hard coatings

M. Balaceanu, M. Braic, V. Braic, A. Vladescu, C. C. Negrila

Результат исследований: Материалы для журналаСтатьярецензирование

30 Цитирования (Scopus)


X-ray Photoelectron Spectroscopy (XPS) was used to investigate the chemical state of ZrC coatings deposited by cathodic arc method. A chemistry model of the ZrC films has been proposed. It was pointed out that on the films surface a highly oxidized passive layer, containing also carbon and oxygen as contaminants, was formed. The film bulk was composed by a mixture of ZrC (the dominant phase), ZrO2 and free carbon.

Язык оригиналаАнглийский
Страницы (с-по)2557-2560
Число страниц4
ЖурналJournal of Optoelectronics and Advanced Materials
Номер выпуска5
СостояниеОпубликовано - 1 окт 2005
Опубликовано для внешнего пользованияДа

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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