Surface chemistry of plasma deposited ZrC hard coatings

M. Balaceanu, M. Braic, V. Braic, A. Vladescu, C. C. Negrila

Результат исследований: Материалы для журнала › Статья › рецензирование

Аннотация

X-ray Photoelectron Spectroscopy (XPS) was used to investigate the chemical state of ZrC coatings deposited by cathodic arc method. A chemistry model of the ZrC films has been proposed. It was pointed out that on the films surface a highly oxidized passive layer, containing also carbon and oxygen as contaminants, was formed. The film bulk was composed by a mixture of ZrC (the dominant phase), ZrO₂ and free carbon.

Язык оригинала	Английский
Страницы (с-по)	2557-2560
Число страниц	4
Журнал	Journal of Optoelectronics and Advanced Materials
Том	7
Номер выпуска	5
Состояние	Опубликовано - 1 окт 2005
Опубликовано для внешнего пользования	Да

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

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AU - Vladescu, A.

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KW - Chemical composition

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