The cross section of a Si surface layer implanted with <sup>64</sup>Zn<sup>+</sup> and <sup>16</sup>O<sup>+</sup> ions is visualized via high-resolution transmission electron microscopy, and its evolution as a result of thermal annealing is investigated. The profiles of impurities implanted into this layer, which are measured by means of secondary-ion mass spectrometry, as well as their changes arising from heat treatment, are analyzed. The surface morphology is examined with the help of atomic-force microscopy.
ASJC Scopus subject areas
- Surfaces, Coatings and Films