Structure of the local environment of titanium atoms in multicomponent nitride coatings produced by plasma-ion techniques

O. V. Krysina, N. A. Timchenko, Nikolay Nikolaevich Koval, Ya V. Zubavichus

Результат исследований: Материалы для журнала

2 Цитирования (Scopus)

Выдержка

An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Extended X-ray Absorption Fine Structure (EXAFS) near the K-edge of titanium in nanocrystalline titanium nitride coatings containing additives of copper, silicon, and aluminum. Using the observation data, the structure parameters of the local environment of titanium atoms have been estimated for the coatings. According to crystallographic data, the Ti-N distance in the bulk phase of titanium nitride is 2.12 Å and the Ti-Ti distance is 3.0 Å. Nearly these values have been obtained for the respective parameters of the coatings. The presence of copper as an additive in a TiN coating increases the Ti-N distance inappreciably compared to that estimated for titanium nitride, whereas addition of silicon decreases the bond distance. It has been revealed that the copper and silicon atoms in Ti-Cu-N and Ti-Si-N coatings do not enter into the crystallographic phase of titanium nitride and do not form bonds with titanium and nitrogen, whereas the aluminum atoms in Ti-Al-N coatings form intermetallic phases with titanium and nitride phases.

Язык оригиналаАнглийский
Номер статьи012060
ЖурналJournal of Physics: Conference Series
Том669
Номер выпуска1
DOI
СостояниеОпубликовано - 14 янв 2016
Событие7th Conference on Low Temperature Plasma in the Processes of Functional Coating Preparation - Kazan, Российская Федерация
Продолжительность: 4 ноя 20157 ноя 2015

Отпечаток

nitrides
titanium
titanium nitrides
coatings
atoms
ions
copper
silicon
aluminum
intermetallics
x rays
fine structure
nitrogen

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Цитировать

Structure of the local environment of titanium atoms in multicomponent nitride coatings produced by plasma-ion techniques. / Krysina, O. V.; Timchenko, N. A.; Koval, Nikolay Nikolaevich; Zubavichus, Ya V.

В: Journal of Physics: Conference Series, Том 669, № 1, 012060, 14.01.2016.

Результат исследований: Материалы для журнала

@article{a077e9231590480381a41aab96bbe842,
title = "Structure of the local environment of titanium atoms in multicomponent nitride coatings produced by plasma-ion techniques",
abstract = "An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Extended X-ray Absorption Fine Structure (EXAFS) near the K-edge of titanium in nanocrystalline titanium nitride coatings containing additives of copper, silicon, and aluminum. Using the observation data, the structure parameters of the local environment of titanium atoms have been estimated for the coatings. According to crystallographic data, the Ti-N distance in the bulk phase of titanium nitride is 2.12 {\AA} and the Ti-Ti distance is 3.0 {\AA}. Nearly these values have been obtained for the respective parameters of the coatings. The presence of copper as an additive in a TiN coating increases the Ti-N distance inappreciably compared to that estimated for titanium nitride, whereas addition of silicon decreases the bond distance. It has been revealed that the copper and silicon atoms in Ti-Cu-N and Ti-Si-N coatings do not enter into the crystallographic phase of titanium nitride and do not form bonds with titanium and nitrogen, whereas the aluminum atoms in Ti-Al-N coatings form intermetallic phases with titanium and nitride phases.",
author = "Krysina, {O. V.} and Timchenko, {N. A.} and Koval, {Nikolay Nikolaevich} and Zubavichus, {Ya V.}",
year = "2016",
month = "1",
day = "14",
doi = "10.1088/1742-6596/669/1/012060",
language = "English",
volume = "669",
journal = "Journal of Physics: Conference Series",
issn = "1742-6588",
publisher = "IOP Publishing Ltd.",
number = "1",

}

TY - JOUR

T1 - Structure of the local environment of titanium atoms in multicomponent nitride coatings produced by plasma-ion techniques

AU - Krysina, O. V.

AU - Timchenko, N. A.

AU - Koval, Nikolay Nikolaevich

AU - Zubavichus, Ya V.

PY - 2016/1/14

Y1 - 2016/1/14

N2 - An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Extended X-ray Absorption Fine Structure (EXAFS) near the K-edge of titanium in nanocrystalline titanium nitride coatings containing additives of copper, silicon, and aluminum. Using the observation data, the structure parameters of the local environment of titanium atoms have been estimated for the coatings. According to crystallographic data, the Ti-N distance in the bulk phase of titanium nitride is 2.12 Å and the Ti-Ti distance is 3.0 Å. Nearly these values have been obtained for the respective parameters of the coatings. The presence of copper as an additive in a TiN coating increases the Ti-N distance inappreciably compared to that estimated for titanium nitride, whereas addition of silicon decreases the bond distance. It has been revealed that the copper and silicon atoms in Ti-Cu-N and Ti-Si-N coatings do not enter into the crystallographic phase of titanium nitride and do not form bonds with titanium and nitrogen, whereas the aluminum atoms in Ti-Al-N coatings form intermetallic phases with titanium and nitride phases.

AB - An experiment was performed to examine the X-ray Absorption Near-Edge Structure (XANES) and the Extended X-ray Absorption Fine Structure (EXAFS) near the K-edge of titanium in nanocrystalline titanium nitride coatings containing additives of copper, silicon, and aluminum. Using the observation data, the structure parameters of the local environment of titanium atoms have been estimated for the coatings. According to crystallographic data, the Ti-N distance in the bulk phase of titanium nitride is 2.12 Å and the Ti-Ti distance is 3.0 Å. Nearly these values have been obtained for the respective parameters of the coatings. The presence of copper as an additive in a TiN coating increases the Ti-N distance inappreciably compared to that estimated for titanium nitride, whereas addition of silicon decreases the bond distance. It has been revealed that the copper and silicon atoms in Ti-Cu-N and Ti-Si-N coatings do not enter into the crystallographic phase of titanium nitride and do not form bonds with titanium and nitrogen, whereas the aluminum atoms in Ti-Al-N coatings form intermetallic phases with titanium and nitride phases.

UR - http://www.scopus.com/inward/record.url?scp=84964577711&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84964577711&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/669/1/012060

DO - 10.1088/1742-6596/669/1/012060

M3 - Conference article

AN - SCOPUS:84964577711

VL - 669

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 1

M1 - 012060

ER -