Selective deposition of polycrystalline diamond films using photolithography with addition of nanodiamonds as nucleation centers

V. V. Okhotnikov, S. A. Linnik, Alexander Valerievich Gaydaychuk, D. V. Shashev, G. Yu Nazarova, V. I. Yurchenko

Результат исследований: Материалы для журнала

5 Цитирования (Scopus)

Выдержка

A new method of selective deposition of polycrystalline diamond has been developed and studied. The diamond coatings with a complex, predetermined geometry and resolution up to 5 μm were obtained. A high density of polycrystallites in the coating area was reached (up to 32•107 pcs/cm2). The uniformity of the film reached 100%, and the degree of the surface contamination by parasitic crystals did not exceed 2%. The technology was based on the application of the standard photolithography with an addition of nanodiamond suspension into the photoresist that provided the creation of the centers of further nucleation in the areas which require further overgrowth. The films were deposited onto monocrystalline silicon substrates using the method of "hot filaments" in the CVD reactor. The properties of the coating and the impact of the nanodiamond suspension concentration in the photoresist were also studied. The potential use of the given method includes a high resolution, technological efficiency, and low labor costs compared to the standard methods (laser treatment, chemical etching in aggressive environments,).

Язык оригиналаАнглийский
Номер статьи012001
ЖурналIOP Conference Series: Materials Science and Engineering
Том116
Номер выпуска1
DOI
СостояниеОпубликовано - 3 мар 2016
СобытиеInternational Conference on Advanced Materials and New Technologies in Modern Materials Science 2015, AMNT 2015 - Tomsk, Российская Федерация
Продолжительность: 9 ноя 201511 ноя 2015

Отпечаток

Nanodiamonds
Diamond films
Photolithography
Diamond
Nucleation
Photoresists
Coatings
Diamonds
Suspensions
Monocrystalline silicon
Chemical vapor deposition
Etching
Contamination
Personnel
Crystals
Geometry
Lasers
Substrates
Costs

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Цитировать

Selective deposition of polycrystalline diamond films using photolithography with addition of nanodiamonds as nucleation centers. / Okhotnikov, V. V.; Linnik, S. A.; Gaydaychuk, Alexander Valerievich; Shashev, D. V.; Nazarova, G. Yu; Yurchenko, V. I.

В: IOP Conference Series: Materials Science and Engineering, Том 116, № 1, 012001, 03.03.2016.

Результат исследований: Материалы для журнала

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AU - Okhotnikov, V. V.

AU - Linnik, S. A.

AU - Gaydaychuk, Alexander Valerievich

AU - Shashev, D. V.

AU - Nazarova, G. Yu

AU - Yurchenko, V. I.

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AB - A new method of selective deposition of polycrystalline diamond has been developed and studied. The diamond coatings with a complex, predetermined geometry and resolution up to 5 μm were obtained. A high density of polycrystallites in the coating area was reached (up to 32•107 pcs/cm2). The uniformity of the film reached 100%, and the degree of the surface contamination by parasitic crystals did not exceed 2%. The technology was based on the application of the standard photolithography with an addition of nanodiamond suspension into the photoresist that provided the creation of the centers of further nucleation in the areas which require further overgrowth. The films were deposited onto monocrystalline silicon substrates using the method of "hot filaments" in the CVD reactor. The properties of the coating and the impact of the nanodiamond suspension concentration in the photoresist were also studied. The potential use of the given method includes a high resolution, technological efficiency, and low labor costs compared to the standard methods (laser treatment, chemical etching in aggressive environments,).

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