Repetitively pulsed vacuum arc ion and plasma sources and new methods of ion and ion-plasma treatment of materials

Результат исследований: Материалы для журналаСтатья

37 Цитирования (Scopus)

Выдержка

A brief review is presented of the "Raduga 1-5" repetitively pulsed vacuum arc ion sources. Their operating principles and functional ranges are described. The Raduga ion sources provide single-and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion beams, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion implantation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. "Raduga 5" ion and plasma source operates in a d.c. mode of plasma formation and repetitively pulsed mode of ion beam generation. A new simple and effective system for filtering a plasma flux from the microparticle fraction and the neutral component is described.

Язык оригиналаАнглийский
Страницы (с-по)9-15
Число страниц7
ЖурналSurface and Coatings Technology
Том96
Номер выпуска1
СостояниеОпубликовано - 3 ноя 1997

Отпечаток

Plasma sources
Ion sources
ion sources
arcs
Vacuum
Ions
Ion beams
Plasmas
vacuum
Ion implantation
ion beams
ions
pulses
Plasma deposition
microparticles
ion implantation
Fluxes
implantation
dosage
Chemical analysis

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Цитировать

Repetitively pulsed vacuum arc ion and plasma sources and new methods of ion and ion-plasma treatment of materials. / Ryabchikov, Alexander I.

В: Surface and Coatings Technology, Том 96, № 1, 03.11.1997, стр. 9-15.

Результат исследований: Материалы для журналаСтатья

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