Radiation-thermal activation of silicon implanted in gallium arsenide

The layer density, density profile, and mobility of electrons in ²⁸Si-ion-doped layers of semiinsulating GaAs after radiation annealing with electron energy above and below the defect formation threshold and after thermal annealing in the temperature range T_a = 590-830°C are investigated. It is shown that for radiation annealing energy above the defect formation threshold ion-doped layers are formed with much lower annealing temperatures, and the degree of electrical activation of silicon in these layers is high and the density of electron mobility limiting defects is low.