PVD of coatings based on plasma filter application

A. I. Ryabchikov, I. B. Stepanov, Ivan Anisimovich Shulepov

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Аннотация

The paper presents the results of investigating the formation of vacuum-arc plasma flow cleaned from the microparticle fraction. The plasma filter design is based on plasma spread in a channel formed by electrodes located at an angle with the axis of an arc evaporator. The effects of magnetic insulation of the electrodes and the positive near-electrode potential drop on the mechanisms of charged plasma component spread are investigated. The results of the obtained experimental data are discussed.

Язык оригиналаАнглийский
Название основной публикации5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001
ИздательInstitute of Electrical and Electronics Engineers Inc.
Страницы383-386
Число страниц4
Том1
ISBN (печатное издание)0780370082, 9780780370081
DOI
СостояниеОпубликовано - 2001
Событие5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 - Tomsk, Российская Федерация
Продолжительность: 26 июн 20013 июл 2001

Другое

Другое5th Korea-Russia International Symposium on Science and Technology, KORUS 2001
СтранаРоссийская Федерация
ГородTomsk
Период26.6.013.7.01

ASJC Scopus subject areas

  • Clinical Biochemistry
  • Computer Networks and Communications
  • Biotechnology
  • Civil and Structural Engineering
  • Mechanics of Materials
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films

Fingerprint Подробные сведения о темах исследования «PVD of coatings based on plasma filter application». Вместе они формируют уникальный семантический отпечаток (fingerprint).

  • Цитировать

    Ryabchikov, A. I., Stepanov, I. B., & Shulepov, I. A. (2001). PVD of coatings based on plasma filter application. В 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001 (Том 1, стр. 383-386). [975159] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/KORUS.2001.975159