Pulsed ion beam formation of highly doped GaAs layers

Rustem M. Bayazitov, Landish Kh Antonova, Ildus B. Khaibullin, Gennadii E. Remnev

Результат исследований: Материалы для журналаСтатьярецензирование

5 Цитирования (Scopus)


The formation of heavily doped n-GaAs layers using continuous ion implantation and subsequent treatment by powerful pulsed ion beams has been investigated. Using Auger electron spectroscopy (AES), electrical measurements and computer simulations, correlation between donor distributions and electrical activation was established. It is shown that the n+-GaAs layers (n = 1019-1020 cm-3) are formed in the deep tail of the impurity atom distributions. Thermal stability of formed supersaturated layers was investigated.

Язык оригиналаАнглийский
Страницы (с-по)418-421
Число страниц4
ЖурналNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Номер выпуска1-4
СостояниеОпубликовано - 1 янв 1998

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Fingerprint Подробные сведения о темах исследования «Pulsed ion beam formation of highly doped GaAs layers». Вместе они формируют уникальный семантический отпечаток (fingerprint).