Plasma opening switch operation with microsecond generator

P. S. Ananjin, V. M. Bystritskii, I. B. Ivanov, V. B. Karpov, B. M. Koval'chuk, Y. E. Krasik, I. V. Lisitsyn, E. V. Paul, A. A. Sinebrjukhov, V. G. Tolmatcheva

    Результат исследования: Материалы для книги/типы отчетовМатериалы для конференции

    Аннотация

    The results of plasma opening switch (POS) operation with a microsecond 200-kJ inductive store are given. The studies concentrated on the deterioration of the microsecond POS characteristics in comparison with a nanosecond POS and on the optimization of the former for generation of the high-power ion and electron beams. The investigation showed a decrease of the POS impedance with increased time delay between generator firing and the moment of switching and with decreased plasma translation length. The multithread spiral or cone form of the inner POS electrode displayed a 1.5 times increase of POS impedance. Different types of magnetic mirror arrangement at the POS exit resulted in improved POS characteristics and decreased plasma translation length. The parameters of a coaxial ion diode with axial magnetic field installed after the POS and the characteristics of its high-power ion beam have been studied.

    Язык оригиналаАнглийский
    Заголовок главной публикацииIEEE Int Conf Plasma Sci 1989
    Редакторы Anon
    Место публикацииPiscataway, NJ, United States
    ИздательPubl by IEEE
    Страницы43
    Количество страниц1
    Статус публикацииОпубликовано - 1989
    СобытиеIEEE International Conference on Plasma Science 1989 - Buffalo, NY, USA
    Длительность: 22 мая 198924 мая 1989

    Другое

    ДругоеIEEE International Conference on Plasma Science 1989
    ГородBuffalo, NY, USA
    Период22.5.8924.5.89

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    ASJC Scopus subject areas

    • Engineering(all)

    Цитировать

    Ananjin, P. S., Bystritskii, V. M., Ivanov, I. B., Karpov, V. B., Koval'chuk, B. M., Krasik, Y. E., ... Tolmatcheva, V. G. (1989). Plasma opening switch operation with microsecond generator. В Anon (Ред.), IEEE Int Conf Plasma Sci 1989 (стр. 43). Piscataway, NJ, United States: Publ by IEEE.