Physical and mechanical properties of Ti/Al multilayer heat releasing coatings

Jindřich Musil, Petr Stupka, Šárka Zuzjaková, Radomír Čerstvý

Результат исследований: Материалы для журналаСтатья

4 Цитирования (Scopus)

Выдержка

The paper reports on physical and mechanical properties of sputtered Ti/Al multilayer coatings with a bilayer thickness Λ ranging from 2 to 172 nm releasing heat during annealing. The temperature Thr at which the heat is released during reaction between Al and Ti atoms is investigated. It was found that: 1) Thr: a) decreases from ∼420 to 390°C for the coatings with Λ decreasing from 172 to 17 nm; b) ranges from ∼480 to ∼600°C for the coatings with Λ ≤ 12 nm; 2) the heat ΔHTi/Al evolved in the reaction increases from 5 to 35 kJ/mol with increasing Λ. Besides, it is shown that: 1) the heat can be released also during one pulse of the rapid thermal annealing up to 600°C with heating rate 100°C/s; 2) the released heat results in a strong interaction of the Ti/Al multilayer coating with Si substrate. The mechanical properties of the as-deposited Ti/Al multilayer coatings are also given.

Язык оригиналаАнглийский
Страницы (с-по)78-93
Число страниц16
ЖурналInternational Journal of Nanomanufacturing
Том11
Номер выпуска1-2
DOI
СостояниеОпубликовано - 1 янв 2015

Отпечаток

Multilayers
Physical properties
Coatings
Mechanical properties
Rapid thermal annealing
Heating rate
Hot Temperature
Annealing
Atoms
Substrates
Temperature

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering

Цитировать

Physical and mechanical properties of Ti/Al multilayer heat releasing coatings. / Musil, Jindřich; Stupka, Petr; Zuzjaková, Šárka; Čerstvý, Radomír.

В: International Journal of Nanomanufacturing, Том 11, № 1-2, 01.01.2015, стр. 78-93.

Результат исследований: Материалы для журналаСтатья

Musil, Jindřich ; Stupka, Petr ; Zuzjaková, Šárka ; Čerstvý, Radomír. / Physical and mechanical properties of Ti/Al multilayer heat releasing coatings. В: International Journal of Nanomanufacturing. 2015 ; Том 11, № 1-2. стр. 78-93.
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