Physical and mechanical properties of sputtered Ta-Si-N films with a high (≥40 at%) content of Si

H. Zeman, J. Musil, P. Zeman

Результат исследований: Материалы для журналаСтатья

32 Цитирования (Scopus)

Аннотация

The ternary Ta-Si-N films produced by magnetron sputtering using an alloyed TaSi2 were discussed. The effect of partial pressure of nitrogen on mechanical properties of the films was analyzed under specific conditions. It was stated that the films exhibited an X-ray amorphous structure, with increasing electric resistivity with increasing Si3N4 content. It was observed that the films achieved a high value of harness which was considerably higher than that of bulk Si3N4.

Язык оригиналаАнглийский
Страницы (с-по)646-649
Число страниц4
ЖурналJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Том22
Номер выпуска3
DOI
СостояниеОпубликовано - 1 мая 2004

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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