Phase and elemental composition of silicon-containing hydroxyapatite-based coatings fabricated by RF-magnetron sputtering for medical implants

We studied by X-ray diffraction analysis, IR spectroscopy, and scanning electron microscopy (SEM) the phase composition and the structure of coatings based on silicon-containing hydroxyapatite (Si-HA) deposited by RF-magnetron sputtering. The sputtering target contained two phases (apatite and tricalcium phosphate) and was produced by the ceramic technology from a single-phase mechanically activated powder precursor. The structure of the coating deposited by sputtering from the two-phase target was single phase (hydroxyapatite) and textured in the (002) direction. During deposition, silicate anions partially replaced phosphate ions in the apatite lattice.