Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering

Yong M. Kim, Yun M. Chung, Min J. Jung, J. Vlček, J. Musil, Jeon G. Han

Результат исследований: Материалы для журналаСтатья

13 Цитирования (Scopus)

Выдержка

In this study, a pulsed magnetron sputtering was employed to synthesize TiN films. We deal with pulse parameters such as pulse frequency and duty cycle in argon - Nitrogen plasmas. Also, optical emission spectroscopy and energy resolved mass spectrometry as an integrated plasma diagnostics was employed during synthesis of thin films. The major emission lines and time-averaged ion energy distribution functions (IEDFs) corresponding to various titanium and gas discharge species are in situ surveyed in terms of frequency and duty cycles during deposition. The corresponding surface morphology was analyzed by atomic force microscopy (AFM).

Язык оригиналаАнглийский
Страницы (с-по)835-840
Число страниц6
ЖурналSurface and Coatings Technology
Том200
Номер выпуска1-4 SPEC. ISS.
DOI
СостояниеОпубликовано - 1 окт 2005

Отпечаток

Nitrogen plasma
Plasma diagnostics
Optical emission spectroscopy
Argon
Titanium
Discharge (fluid mechanics)
Magnetron sputtering
Distribution functions
Surface morphology
Mass spectrometry
light emission
optical spectrum
Atomic force microscopy
magnetron sputtering
energy distribution
emission spectra
Gases
distribution functions
Ions
Thin films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Цитировать

Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering. / Kim, Yong M.; Chung, Yun M.; Jung, Min J.; Vlček, J.; Musil, J.; Han, Jeon G.

В: Surface and Coatings Technology, Том 200, № 1-4 SPEC. ISS., 01.10.2005, стр. 835-840.

Результат исследований: Материалы для журналаСтатья

Kim, Yong M. ; Chung, Yun M. ; Jung, Min J. ; Vlček, J. ; Musil, J. ; Han, Jeon G. / Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering. В: Surface and Coatings Technology. 2005 ; Том 200, № 1-4 SPEC. ISS. стр. 835-840.
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T1 - Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering

AU - Kim, Yong M.

AU - Chung, Yun M.

AU - Jung, Min J.

AU - Vlček, J.

AU - Musil, J.

AU - Han, Jeon G.

PY - 2005/10/1

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N2 - In this study, a pulsed magnetron sputtering was employed to synthesize TiN films. We deal with pulse parameters such as pulse frequency and duty cycle in argon - Nitrogen plasmas. Also, optical emission spectroscopy and energy resolved mass spectrometry as an integrated plasma diagnostics was employed during synthesis of thin films. The major emission lines and time-averaged ion energy distribution functions (IEDFs) corresponding to various titanium and gas discharge species are in situ surveyed in terms of frequency and duty cycles during deposition. The corresponding surface morphology was analyzed by atomic force microscopy (AFM).

AB - In this study, a pulsed magnetron sputtering was employed to synthesize TiN films. We deal with pulse parameters such as pulse frequency and duty cycle in argon - Nitrogen plasmas. Also, optical emission spectroscopy and energy resolved mass spectrometry as an integrated plasma diagnostics was employed during synthesis of thin films. The major emission lines and time-averaged ion energy distribution functions (IEDFs) corresponding to various titanium and gas discharge species are in situ surveyed in terms of frequency and duty cycles during deposition. The corresponding surface morphology was analyzed by atomic force microscopy (AFM).

KW - Ion energy distribution function (IEDF)

KW - Magnetron sputtering

KW - OES

KW - Pulsed plasma

KW - TiN deposition

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