Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method

E. N. Bolbasov, P. V. Maryin, K. S. Stankevich, S. I. Goreninskii, V. L. Kudryavtseva, A. I. Mishanin, A. S. Golovkin, A. B. Malashicheva, Y. M. Zhukov, Y. G. Anissimov, S. I. Tverdokhlebov

Результат исследований: Материалы для журналаСтатья

Выдержка

Nitrogen-doped thin titanium dioxide films formed by the reactive magnetron sputtering method on the surface of PLLA electrospun microfibers scaffold were investigated. It was shown that the chemical composition of the films is shifting from titanium dioxide (TiO2) composites saturated with C–NH, C=N, N–C=N and HN–C=O compounds to solid solutions of titanium oxides (TixOy) and titanium oxynitrides (TiOxNy) with the increased time of the treatment. An empirical model describing changes in the chemical composition of the surface due to the treatment was proposed. It was shown that the modification of the PLLA microfibers scaffolds surface improves cell-scaffold and cell–cell interactions with the highest number of viable adherent cells observed on the scaffold treated for 4 min.

Язык оригиналаАнглийский
ЖурналPlasma Chemistry and Plasma Processing
DOI
СостояниеПринято/в печати - 1 янв 2019

Отпечаток

microfibers
Reactive sputtering
Scaffolds
titanium oxides
Magnetron sputtering
Titanium dioxide
magnetron sputtering
Nitrogen
nitrogen
Thin films
chemical composition
thin films
oxynitrides
cells
Titanium oxides
solid solutions
titanium
Titanium
Chemical analysis
Solid solutions

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Цитировать

Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method. / Bolbasov, E. N.; Maryin, P. V.; Stankevich, K. S.; Goreninskii, S. I.; Kudryavtseva, V. L.; Mishanin, A. I.; Golovkin, A. S.; Malashicheva, A. B.; Zhukov, Y. M.; Anissimov, Y. G.; Tverdokhlebov, S. I.

В: Plasma Chemistry and Plasma Processing, 01.01.2019.

Результат исследований: Материалы для журналаСтатья

@article{bbff005c09f94061b51850a7141625e2,
title = "Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method",
abstract = "Nitrogen-doped thin titanium dioxide films formed by the reactive magnetron sputtering method on the surface of PLLA electrospun microfibers scaffold were investigated. It was shown that the chemical composition of the films is shifting from titanium dioxide (TiO2) composites saturated with C–NH, C=N, N–C=N and HN–C=O compounds to solid solutions of titanium oxides (TixOy) and titanium oxynitrides (TiOxNy) with the increased time of the treatment. An empirical model describing changes in the chemical composition of the surface due to the treatment was proposed. It was shown that the modification of the PLLA microfibers scaffolds surface improves cell-scaffold and cell–cell interactions with the highest number of viable adherent cells observed on the scaffold treated for 4 min.",
keywords = "Biocompatibility, Reactive magnetron sputtering, Scaffolds, Thin films",
author = "Bolbasov, {E. N.} and Maryin, {P. V.} and Stankevich, {K. S.} and Goreninskii, {S. I.} and Kudryavtseva, {V. L.} and Mishanin, {A. I.} and Golovkin, {A. S.} and Malashicheva, {A. B.} and Zhukov, {Y. M.} and Anissimov, {Y. G.} and Tverdokhlebov, {S. I.}",
year = "2019",
month = "1",
day = "1",
doi = "10.1007/s11090-019-09956-x",
language = "English",
journal = "Plasma Chemistry and Plasma Processing",
issn = "0272-4324",
publisher = "Springer New York",

}

TY - JOUR

T1 - Nitrogen-Doped Titanium Dioxide Thin Films Formation on the Surface of PLLA Electrospun Microfibers Scaffold by Reactive Magnetron Sputtering Method

AU - Bolbasov, E. N.

AU - Maryin, P. V.

AU - Stankevich, K. S.

AU - Goreninskii, S. I.

AU - Kudryavtseva, V. L.

AU - Mishanin, A. I.

AU - Golovkin, A. S.

AU - Malashicheva, A. B.

AU - Zhukov, Y. M.

AU - Anissimov, Y. G.

AU - Tverdokhlebov, S. I.

PY - 2019/1/1

Y1 - 2019/1/1

N2 - Nitrogen-doped thin titanium dioxide films formed by the reactive magnetron sputtering method on the surface of PLLA electrospun microfibers scaffold were investigated. It was shown that the chemical composition of the films is shifting from titanium dioxide (TiO2) composites saturated with C–NH, C=N, N–C=N and HN–C=O compounds to solid solutions of titanium oxides (TixOy) and titanium oxynitrides (TiOxNy) with the increased time of the treatment. An empirical model describing changes in the chemical composition of the surface due to the treatment was proposed. It was shown that the modification of the PLLA microfibers scaffolds surface improves cell-scaffold and cell–cell interactions with the highest number of viable adherent cells observed on the scaffold treated for 4 min.

AB - Nitrogen-doped thin titanium dioxide films formed by the reactive magnetron sputtering method on the surface of PLLA electrospun microfibers scaffold were investigated. It was shown that the chemical composition of the films is shifting from titanium dioxide (TiO2) composites saturated with C–NH, C=N, N–C=N and HN–C=O compounds to solid solutions of titanium oxides (TixOy) and titanium oxynitrides (TiOxNy) with the increased time of the treatment. An empirical model describing changes in the chemical composition of the surface due to the treatment was proposed. It was shown that the modification of the PLLA microfibers scaffolds surface improves cell-scaffold and cell–cell interactions with the highest number of viable adherent cells observed on the scaffold treated for 4 min.

KW - Biocompatibility

KW - Reactive magnetron sputtering

KW - Scaffolds

KW - Thin films

UR - http://www.scopus.com/inward/record.url?scp=85060198559&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85060198559&partnerID=8YFLogxK

U2 - 10.1007/s11090-019-09956-x

DO - 10.1007/s11090-019-09956-x

M3 - Article

AN - SCOPUS:85060198559

JO - Plasma Chemistry and Plasma Processing

JF - Plasma Chemistry and Plasma Processing

SN - 0272-4324

ER -