New metal ion and plasma surface modification methods

Результат исследований: Материалы для журналаСтатья

Выдержка

The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in the Nuclear Physics Institute, Tomsk (NPI), for dc vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively - pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and the method of coating deposition and ion implantation, including an application of the filtered dc metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10% - 99%. The features of ion implantation and metal plasma deposition for dielectric, semi-conducting and metal samples are presented.

Язык оригиналаАнглийский
Страницы (с-по)8637-8640
Число страниц4
ЖурналSurface and Coatings Technology
Том201
Номер выпуска19-20 SPEC. ISS.
DOI
СостояниеОпубликовано - 5 авг 2007

Отпечаток

Plasma deposition
Metal ions
Surface treatment
metal ions
Metals
Plasmas
Ion implantation
Ions
metals
Metalloids
ion implantation
implantation
Nuclear physics
Plasma flow
Plasma sources
Bias voltage
ions
Ion beams
Sputtering
nuclear physics

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Цитировать

New metal ion and plasma surface modification methods. / Ryabchikov, Alexander I.; Stepanov, Igor B.

В: Surface and Coatings Technology, Том 201, № 19-20 SPEC. ISS., 05.08.2007, стр. 8637-8640.

Результат исследований: Материалы для журналаСтатья

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