Nanocrystalline nitride coatings deposited by vacuum arc plasma-assisted method

O. V. Krysina, N. N. Koval, Yu F. Ivanov, N. A. Timchenko, T. Baumbach, S. Doyle, T. Slobodskyy

Результат исследований: Материалы для журналаСтатья

Аннотация

In the given work, experiments on research of formation of titanium nitride doped with copper (≤12 at %) produced by plasma-assisted vacuum arc deposition by evaporation of sintered Ti-Cu cathodes were carried out. It was revealed that Ti-Cu-N coatings have high hardness (≈40 GPa), high elastic recovery (≥50%), low friction coefficient (≈0.2) and high adhesion to a substrate compared with typical TiN coatings. By methods of transmission electron microscopy of thin foils and x-ray diffraction, it was showed that the coating crystallites consist of δ-TiN with the average crystallite size of 10-30 nm and the sheath of doping elements (copper) with thickness of 2-3 monolayers is formed around of TiN crystallites.

Язык оригиналаАнглийский
Номер статьи012021
ЖурналJournal of Physics: Conference Series
Том370
Номер выпуска1
DOI
СостояниеОпубликовано - 2012

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

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