The development and production of highly perfect semiconductor materials and their application in components in various branches of technology requires information on their structural perfection. Of crucial importance is the relationship between structural properties and all the technological processing steps, starting from the raw material right up to the completed device. The availability of reliable experimental facilities at synchrotron radiation sources, with unique properties such as high intensity, small focus, high brilliance, and good coherence at the sample opens up advanced possibilities with application potential also for nondestructive testing and characterization of materials and components from research and industry. We illustrate principles and instrumentation of full field imaging methods with synchrotron radiation and examples of application to x-ray inspection, structure and defect analysis. The aim of direct-space imaging methods is the use of the principles of physical interaction for the imaging of micro-structures. Struct. Variations and Defects in A Wide Fld. of Applic.. X-ray Imaging Methods Using Synchrt. Radiat. Have the Potential to Bridge the Gap between Conventional 2D and 3D Direct Imaging Techniques Using Lab. Sources and Electron Microscopic Methods, That Means to Probe the Reg. between 10 im and A Few Nm. Synchrt. Radiat. Is Furthermore Favorable to Investigate Hidden Int. Struct. at Highest Level of Image Contrast and Resolution of Fine Details. X-ray Imaging Methods Are Essentially Non-destructive and Allow the Use and Combination of Various Contrast Mechanisms for the Imaging of the Geometric, Crystallographic, Chem. and Electron. Struct. of Sample Mat.
|Состояние||Опубликовано - 2009|
ASJC Scopus subject areas
- Mechanical Engineering
- Mechanics of Materials
- Materials Science(all)