MOCVD growth and study of magnetic Co films

S. I. Dorovskikh, R. R. Hairullin, S. V. Sysoev, V. V. Kriventsov, A. V. Panin, Y. V. Shubin, N. B. Morozova, N. V. Gelfond, S. V. Korenev

Результат исследований: Материалы для журналаСтатья

Выдержка

The Co(N'acN'ac)2 complex, namely bis(2-methylamino-4-methyliminato-penten) cobalt(II), was for the first time used as a precursor for producing Co films via metal-organic chemical vapour deposition. This chelate exhibits good volatility ln (P/P°)=26·45-14006·7/T(K) at moderate temperature values (382-427 K). Co films were grown on Si (100) substrates and studied by Xray diffraction, extended X-ray absorption fine structure, atomic force and scanning electron ; microscopy, energy dispersive X-ray analysis and optical profilometry. Deposition conditions corresponding to the optimal electrical and magnetic characteristics of Co thin films are found.

Язык оригиналаАнглийский
Страницы (с-по)8-14
Число страниц7
ЖурналSurface Engineering
Том32
Номер выпуска1
DOI
СостояниеОпубликовано - 1 янв 2016

Отпечаток

Metallorganic chemical vapor deposition
metalorganic chemical vapor deposition
Organic Chemicals
Profilometry
Energy dispersive X ray analysis
volatility
Organic chemicals
X ray absorption
Cobalt
chelates
Chemical vapor deposition
Microscopic examination
x rays
cobalt
Diffraction
Metals
fine structure
microscopy
Scanning
Thin films

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Цитировать

Dorovskikh, S. I., Hairullin, R. R., Sysoev, S. V., Kriventsov, V. V., Panin, A. V., Shubin, Y. V., ... Korenev, S. V. (2016). MOCVD growth and study of magnetic Co films. Surface Engineering, 32(1), 8-14. https://doi.org/10.1179/1743294414Y.0000000424

MOCVD growth and study of magnetic Co films. / Dorovskikh, S. I.; Hairullin, R. R.; Sysoev, S. V.; Kriventsov, V. V.; Panin, A. V.; Shubin, Y. V.; Morozova, N. B.; Gelfond, N. V.; Korenev, S. V.

В: Surface Engineering, Том 32, № 1, 01.01.2016, стр. 8-14.

Результат исследований: Материалы для журналаСтатья

Dorovskikh, SI, Hairullin, RR, Sysoev, SV, Kriventsov, VV, Panin, AV, Shubin, YV, Morozova, NB, Gelfond, NV & Korenev, SV 2016, 'MOCVD growth and study of magnetic Co films', Surface Engineering, том. 32, № 1, стр. 8-14. https://doi.org/10.1179/1743294414Y.0000000424
Dorovskikh SI, Hairullin RR, Sysoev SV, Kriventsov VV, Panin AV, Shubin YV и соавт. MOCVD growth and study of magnetic Co films. Surface Engineering. 2016 Янв. 1;32(1):8-14. https://doi.org/10.1179/1743294414Y.0000000424
Dorovskikh, S. I. ; Hairullin, R. R. ; Sysoev, S. V. ; Kriventsov, V. V. ; Panin, A. V. ; Shubin, Y. V. ; Morozova, N. B. ; Gelfond, N. V. ; Korenev, S. V. / MOCVD growth and study of magnetic Co films. В: Surface Engineering. 2016 ; Том 32, № 1. стр. 8-14.
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AU - Shubin, Y. V.

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