Mechanisms and behavioral regularities of the vacuum-arc microparticles near and on a potential electrode immersed in plasma

Результат исследований: Материалы для журналаСтатья

Выдержка

It is experimentally revealed that the pulse-periodic bias potential provides a multifold decrease in the surface content of microparticles (MPs). It is ascertained that a decrease in the MP concentration at the target can be explained by several physical mechanisms. From experiments with a fine-structure grid, it is found that less than 10% of MPs negatively charged in the plasma can be reflected in the electric field of the charge-separation layer near the sample. A substantial decrease in the MP density occurs after direct interaction between a MP and the sample under the action of a negative HF short-pulse bias potential. Almost half the MP surface density is caused by ion sputtering. A twelvefold reduction in the MP surface density is attained when the target is irradiated for 2 min.

Язык оригиналаАнглийский
Страницы (с-по)1148-1155
Число страниц8
ЖурналJournal of Surface Investigation
Том7
Номер выпуска6
DOI
СостояниеОпубликовано - 1 ноя 2013

Отпечаток

Vacuum
Plasmas
Electrodes
Sputtering
Electric fields
Ions
Experiments

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Цитировать

Mechanisms and behavioral regularities of the vacuum-arc microparticles near and on a potential electrode immersed in plasma. / Ryabchikov, A. I.; Sivin, Denis Olegovich; Bumagina, A. I.; Struts, V. K.

В: Journal of Surface Investigation, Том 7, № 6, 01.11.2013, стр. 1148-1155.

Результат исследований: Материалы для журналаСтатья

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