Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows

A. V. Petrov, A. I. Ryabchikov, I. B. Stepanov, V. K. Struts, V. G. Tolmacheva, Yu P. Usov, Ivan Anisimovich Shulepov

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Выдержка

Results are presented for some processes occurring at different stages of strong adhesion of coatings and modified layers creation with the use of high-dose implantation and deep diffusive doping of elements under pulsed energetic impact. The investigations have been carried out to consider the possibility of combined materials treatment with pulsed ion beams of power density ranging from 103 to 108 W/cm2. The facility includes the accelerator of high-power ion beams and the sources of repetitively-pulsed metal ion beams and metal plasma flows.

Язык оригиналаАнглийский
Название основной публикации5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001
ИздательInstitute of Electrical and Electronics Engineers Inc.
Страницы363-366
Число страниц4
Том1
ISBN (печатное издание)0780370082, 9780780370081
DOI
СостояниеОпубликовано - 2001
Событие5th Korea-Russia International Symposium on Science and Technology, KORUS 2001 - Tomsk, Российская Федерация
Продолжительность: 26 июн 20013 июл 2001

Другое

Другое5th Korea-Russia International Symposium on Science and Technology, KORUS 2001
СтранаРоссийская Федерация
ГородTomsk
Период26.6.013.7.01

Отпечаток

Plasma flow
Ion beams
Mass transfer
Ions
Metals
Ion implantation
Chemical elements
Particle accelerators
Metal ions
Adhesion
Doping (additives)
Coatings

ASJC Scopus subject areas

  • Clinical Biochemistry
  • Computer Networks and Communications
  • Biotechnology
  • Civil and Structural Engineering
  • Mechanics of Materials
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Surfaces, Coatings and Films

Цитировать

Petrov, A. V., Ryabchikov, A. I., Stepanov, I. B., Struts, V. K., Tolmacheva, V. G., Usov, Y. P., & Shulepov, I. A. (2001). Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows. В 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001 (Том 1, стр. 363-366). [975152] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/KORUS.2001.975152

Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows. / Petrov, A. V.; Ryabchikov, A. I.; Stepanov, I. B.; Struts, V. K.; Tolmacheva, V. G.; Usov, Yu P.; Shulepov, Ivan Anisimovich.

5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Том 1 Institute of Electrical and Electronics Engineers Inc., 2001. стр. 363-366 975152.

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Petrov, AV, Ryabchikov, AI, Stepanov, IB, Struts, VK, Tolmacheva, VG, Usov, YP & Shulepov, IA 2001, Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows. в 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. том. 1, 975152, Institute of Electrical and Electronics Engineers Inc., стр. 363-366, 5th Korea-Russia International Symposium on Science and Technology, KORUS 2001, Tomsk, Российская Федерация, 26.6.01. https://doi.org/10.1109/KORUS.2001.975152
Petrov AV, Ryabchikov AI, Stepanov IB, Struts VK, Tolmacheva VG, Usov YP и соавт. Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows. В 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Том 1. Institute of Electrical and Electronics Engineers Inc. 2001. стр. 363-366. 975152 https://doi.org/10.1109/KORUS.2001.975152
Petrov, A. V. ; Ryabchikov, A. I. ; Stepanov, I. B. ; Struts, V. K. ; Tolmacheva, V. G. ; Usov, Yu P. ; Shulepov, Ivan Anisimovich. / Mass transfer of elements in the undersurface layers under combined treatment by pulsed ion beams and plasma flows. 5th Korea-Russia International Symposium on Science and Technology - Proceedings: KORUS 2001. Том 1 Institute of Electrical and Electronics Engineers Inc., 2001. стр. 363-366
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AU - Petrov, A. V.

AU - Ryabchikov, A. I.

AU - Stepanov, I. B.

AU - Struts, V. K.

AU - Tolmacheva, V. G.

AU - Usov, Yu P.

AU - Shulepov, Ivan Anisimovich

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AB - Results are presented for some processes occurring at different stages of strong adhesion of coatings and modified layers creation with the use of high-dose implantation and deep diffusive doping of elements under pulsed energetic impact. The investigations have been carried out to consider the possibility of combined materials treatment with pulsed ion beams of power density ranging from 103 to 108 W/cm2. The facility includes the accelerator of high-power ion beams and the sources of repetitively-pulsed metal ion beams and metal plasma flows.

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