Low energy, high intensity metal ion implantation method for deep dopant containing layer formation

Результат исследований: Материалы для журналаСтатья

10 Цитирования (Scopus)

Выдержка

This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

Язык оригиналаАнглийский
Страницы (с-по)123-128
Число страниц6
ЖурналSurface and Coatings Technology
Том355
DOI
СостояниеОпубликовано - 15 дек 2018

Отпечаток

Aluminum
Ion implantation
Ion beams
Metal ions
ion implantation
metal ions
ion beams
Doping (additives)
Ions
aluminum
high current
Laser pulses
implantation
ion extraction
Plasma flow
Pulse repetition rate
ions
energy
pulse repetition rate
magnetohydrodynamic flow

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Цитировать

Low energy, high intensity metal ion implantation method for deep dopant containing layer formation. / Ryabchikov, Alexander I.; Shevelev, Alexey E.; Sivin, Denis O.; Ivanova, Anna I.; Medvedev, Vladislav N.

В: Surface and Coatings Technology, Том 355, 15.12.2018, стр. 123-128.

Результат исследований: Материалы для журналаСтатья

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abstract = "This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.",
keywords = "Aluminum, High intensity ion beam, Intermetallic layers, Metal ion implantation, Nickel",
author = "Ryabchikov, {Alexander I.} and Shevelev, {Alexey E.} and Sivin, {Denis O.} and Ivanova, {Anna I.} and Medvedev, {Vladislav N.}",
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AU - Ryabchikov, Alexander I.

AU - Shevelev, Alexey E.

AU - Sivin, Denis O.

AU - Ivanova, Anna I.

AU - Medvedev, Vladislav N.

PY - 2018/12/15

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N2 - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

AB - This study describes the first results of high intensity macroparticle-free aluminum ion beam formation and its application to low ion energy implantation. A DC vacuum arc was used to produce aluminum plasma flow. A repetitively pulsed macroparticle-free high intensity aluminum ion beam was formed using a plasma immersion ion extraction combined with ion beam focusing. A very high current ion beam with the current up to 0.475 A at bias pulse duration of 4 μs and the pulse repetition rate of 105 pulses per second was obtained. Nickel substrates were irradiated by aluminum ions with very high current densities up to 100 mA/cm2 and accelerating voltages up to 2.1 kV. The maximum fluence of implantation reached 1.2 × 1021 ion/сm2. The results of the element composition of the modified layer were also investigated.

KW - Aluminum

KW - High intensity ion beam

KW - Intermetallic layers

KW - Metal ion implantation

KW - Nickel

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