Ion flux characteristics in high-power pulsed magnetron sputtering discharges

J. Vlček, P. Kudláček, K. Burcalová, J. Musil

Результат исследований: Материалы для журналаСтатья

46 Цитирования (Scopus)

Выдержка

High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20% duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92%) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).

Язык оригиналаАнглийский
Номер статьи45002
ЖурналEPL
Том77
Номер выпуска4
DOI
СостояниеОпубликовано - 1 фев 2007

Отпечаток

magnetron sputtering
copper
ions
radiant flux density
repetition
energy distribution
mass spectroscopy
low pressure
sputtering
argon
cycles
energy
pulses

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Цитировать

Ion flux characteristics in high-power pulsed magnetron sputtering discharges. / Vlček, J.; Kudláček, P.; Burcalová, K.; Musil, J.

В: EPL, Том 77, № 4, 45002, 01.02.2007.

Результат исследований: Материалы для журналаСтатья

Vlček, J. ; Kudláček, P. ; Burcalová, K. ; Musil, J. / Ion flux characteristics in high-power pulsed magnetron sputtering discharges. В: EPL. 2007 ; Том 77, № 4.
@article{dc9ce36f5d834068a67387cb54bccb10,
title = "Ion flux characteristics in high-power pulsed magnetron sputtering discharges",
abstract = "High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20{\%} duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92{\%}) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).",
author = "J. Vlček and P. Kudl{\'a}ček and K. Burcalov{\'a} and J. Musil",
year = "2007",
month = "2",
day = "1",
doi = "10.1209/0295-5075/77/45002",
language = "English",
volume = "77",
journal = "Europhysics Letters",
issn = "0295-5075",
publisher = "IOP Publishing Ltd.",
number = "4",

}

TY - JOUR

T1 - Ion flux characteristics in high-power pulsed magnetron sputtering discharges

AU - Vlček, J.

AU - Kudláček, P.

AU - Burcalová, K.

AU - Musil, J.

PY - 2007/2/1

Y1 - 2007/2/1

N2 - High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20% duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92%) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).

AB - High-power pulsed dc magnetron discharges for ionized high-rate sputtering of copper films were investigated. The repetition frequency was 1 kHz at a fixed 20% duty cycle and argon pressures of 0.5 Pa and 5 Pa. Time evolutions of the discharge characteristics were measured at a target power density in a pulse up to 950 W/cm2. Time-averaged mass spectroscopy was performed at substrate positions. It was shown that copper ions are strongly dominant (up to 92%) in total ion fluxes onto the substrate. Their energy distributions with a broadened low-energy part at a lower pressure are extended to higher energies (up to 45 eV relative to ground potential for the target-to-substrate distance of 100 mm).

UR - http://www.scopus.com/inward/record.url?scp=77957745027&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77957745027&partnerID=8YFLogxK

U2 - 10.1209/0295-5075/77/45002

DO - 10.1209/0295-5075/77/45002

M3 - Article

AN - SCOPUS:77957745027

VL - 77

JO - Europhysics Letters

JF - Europhysics Letters

SN - 0295-5075

IS - 4

M1 - 45002

ER -