This article describes the processes of forming metal-plasma flows filtered from a microparticle fraction. The plasma filtering system (PFS) is a shutter electrode system lying at an angle with respect to the axis of the vacuum arc evaporator. The principle of operating the plasma filter is based on varying the path of traveling a plasma charged component when the positive near-electrode potential drop is formed. The neutral plasma component, at that, maintains the direction of its motion, and in case when the shutters of the PFS are optically opaque, it is accumulated on its walls. The dependence of efficiency of passing the plasma flow on the amount of the potential being formed, the angle of turning electrodes with respect to the direction of plasma spreading is considered for different designs of the plasma filters. The performance data of the device make it possible to achieve no-presence of the microparticle fraction in the structure of Ti coatings as well as reduction of the number of defects by two orders of magnitude in Al coatings with efficiency of passing the plasma flows by the filter up to 70%.
ASJC Scopus subject areas