Investigation of tungsten dc vacuum arc characteristics. Technological application

I. B. Stepanov, I. A. Ryabchikov, S. V. Dektyarev

Результат исследований: Материалы для журналаСтатья

1 цитирование (Scopus)

Выдержка

The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.

Язык оригиналаАнглийский
Страницы (с-по)6526-6529
Число страниц4
ЖурналSurface and Coatings Technology
Том201
Номер выпуска15
DOI
СостояниеОпубликовано - 23 апр 2007

Отпечаток

Tungsten
tungsten
arcs
Vacuum
Plasmas
coatings
Coatings
vacuum
Bond strength (materials)
adhesion
plasma generators
transition layers
evaporators
arc discharges
Evaporators
Deposition rates
Ion implantation
plasma jets
submerging
ion implantation

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Цитировать

Investigation of tungsten dc vacuum arc characteristics. Technological application. / Stepanov, I. B.; Ryabchikov, I. A.; Dektyarev, S. V.

В: Surface and Coatings Technology, Том 201, № 15, 23.04.2007, стр. 6526-6529.

Результат исследований: Материалы для журналаСтатья

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AB - The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.

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