Выдержка
The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.
| Язык оригинала | Английский |
|---|---|
| Страницы (с-по) | 6526-6529 |
| Число страниц | 4 |
| Журнал | Surface and Coatings Technology |
| Том | 201 |
| Номер выпуска | 15 |
| DOI | |
| Состояние | Опубликовано - 23 апр 2007 |
Отпечаток
ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces
Цитировать
Investigation of tungsten dc vacuum arc characteristics. Technological application. / Stepanov, I. B.; Ryabchikov, I. A.; Dektyarev, S. V.
В: Surface and Coatings Technology, Том 201, № 15, 23.04.2007, стр. 6526-6529.Результат исследований: Материалы для журнала › Статья
}
TY - JOUR
T1 - Investigation of tungsten dc vacuum arc characteristics. Technological application
AU - Stepanov, I. B.
AU - Ryabchikov, I. A.
AU - Dektyarev, S. V.
PY - 2007/4/23
Y1 - 2007/4/23
N2 - The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.
AB - The paper presents the results of investigation of legitimacies of generation of W vacuum arc plasma in dc mode and their application for deposition of coatings with high adhesion strength. The developed construction of the vacuum arc evaporator (VAE) ensures dc mode of W plasma generation in the current range of 350 A-750 A at arc voltage drop of more than 40 V. It is shown that at discharge current of 750 A W coating deposition rate can achieve 80 μm/h, which offers attractive perspectives for a number of technological applications of W plasma. We also investigated some legitimacies of changes in element composition, adhesion strength, hardness, morphology and structure of W coatings formed from plasma of a dc vacuum arc discharge (VAD) depending on regimes of coating deposition. It is shown that use of Ti plasma for creating a thick transition and damping layer under the regime of plasma immersion ion implantation and coating deposition under intensive ion mixing allows to increase adhesion strength of W coatings by several times.
KW - Coating
KW - Plasma filter
KW - Vacuum arc
UR - http://www.scopus.com/inward/record.url?scp=33847341662&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33847341662&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2006.09.013
DO - 10.1016/j.surfcoat.2006.09.013
M3 - Article
AN - SCOPUS:33847341662
VL - 201
SP - 6526
EP - 6529
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
SN - 0257-8972
IS - 15
ER -