Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering

Аннотация

Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O–N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti–O–N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.

Язык оригинала	Английский
Страницы (с-по)	1143-1147
Число страниц	5
Журнал	Bulletin of the Russian Academy of Sciences: Physics
Том	82
Номер выпуска	9
DOI	https://doi.org/10.3103/S1062873818090058
Состояние	Опубликовано - 1 сен 2018

ASJC Scopus subject areas

Physics and Astronomy(all)

Доступ к документу

10.3103/S1062873818090058

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Цитировать

Boytsova, E. L., & Leonova, L. A. (2018). Investigating Thin Ti–O–N Films Deposited via Reactive Magnetron Sputtering. Bulletin of the Russian Academy of Sciences: Physics, 82(9), 1143-1147. https://doi.org/10.3103/S1062873818090058

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abstract = "Infrared spectroscopy and atomic emission analysis help establish the corrosion resistance of Ti‒O–N films deposited on steel substrates via reactive magnetron sputtering, along with potential biological activity by detecting nitric oxide in model solutions after contact with Ti–O–N coatings. Differential thermal analysis and scanning electron microscopy allow the thermal stability of the films to be judged at temperatures of up to 1300°C.",

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