Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition

A. D. Pogrebnjak, R. Krause-Rehberg, A. I. Kupchishin, A. A. Drobyshevskaya, V. I. Ivaschenko, A. P. Shypylenko, D. A. Kolesnikov, N. K. Erdybaeva

Результат исследований: Материалы для журналаСтатья

Аннотация

Original results of investigations of Ti-Si-N nanostructured coatings deposited by cathodic vacuum arc evaporation are presented in this work. Investigations are provided by the supplementing each other methods: slow positron beam, XRD, SEM with EDS, RBS, AFM, as well as measurement of nanohardness and elastic modulus before and after annealing at 600 °C (for 30 min). It was found that after deposition the solid solution (Ti, Si) N is formed in coatings. In this solid solution the stress-strain state (compressive strain - 2,6%) is occurring. As a result of thermal annealing the deformation slightly decreases to - 2,3%. Measurements provided by method of Positron annihilation spectroscopy (PAS) show that at the interfaces of coatings the segregated defects are occurring as a result of thermal diffusion process. These defects form clusters of vacancy-type defects of a high concentration - from 5·1016 cm-3 to 7,5·1017 cm- 3.

Язык оригиналаАнглийский
Страницы (с-по)134-139
Число страниц6
ЖурналProblems of Atomic Science and Technology
Номер выпуска2
СостояниеОпубликовано - 22 апр 2013
Опубликовано для внешнего пользованияДа

ASJC Scopus subject areas

  • Radiation
  • Nuclear and High Energy Physics
  • Nuclear Energy and Engineering
  • Materials Science(all)

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    Pogrebnjak, A. D., Krause-Rehberg, R., Kupchishin, A. I., Drobyshevskaya, A. A., Ivaschenko, V. I., Shypylenko, A. P., Kolesnikov, D. A., & Erdybaeva, N. K. (2013). Influence of thermal annealing on the structure of defects and properties of nanostructures Ti-Si-N coatings obtained by cathode vacuum arc deposition. Problems of Atomic Science and Technology, (2), 134-139.