The results of investigating the plasma-immersion ion implantation of titanium into Zr–1Nb alloy from arc-discharge plasma are presented. The investigations are performed using 1.5-kV bias voltage applied to the sample by means of a coaxial plasma filter for 5, 15, and 30 min. Scanning electron and atomic-force microscopy data demonstrate that, after implantation, grains with sizes of ~50–100 nm and craters with lateral sizes varying from ~1 μm to vanishingly small values are detected on the surface. Energy-dispersive X-ray spectroscopy data indicate the formation of an oxide film under titanium implantation. It follows from X-ray diffraction analysis that implanted titanium is in the dissolved state and the crystal-lattice-parameter ratio c/a increases after ion implantation. The layer-by-layer elemental analysis of the implanted layer performed via optical emission spectroscopy is evidence that the titanium-concentration maximum is shifted to larger depths with incresing implantation duration.
ASJC Scopus subject areas
- Surfaces, Coatings and Films