Influence of the aluminum ion implantation dose on the phase composition of submicrocrystalline titanium

A. V. Nikonenko, N. A. Popova, E. L. Nikonenko, M. P. Kalashnikov, E. M. Oks, I. A. Kurzina

Результат исследований: Материалы для журналаСтатьярецензирование


We report the study of commercially pure titanium (VТ1-0 alloy under Russian classification) in the submicrocrystalline state obtained by the abc-pressing method with the surface modified by the ion implantation technique. Ion implantation was performed using aluminum ions at irradiation doses 1 × 1017, 5 × 1017, and 10 × 1017 ion/cm2 using a MEVVA5.RU source. The grain longitudinal and transverse dimensions were determined before and after ion implantation for varying irradiation doses. We studied the influence of ion implantation and the irradiation dose on the elemental and phase composition of the surface layers of VT1-0 alloy. It has been found that ion implantation results in restructuring of titanium surface layers and in a change of the grain size with the depth of the surface layers. For example, the grain longitudinal size decreases 5 times at the dose rate of 1·1017 ion/cm2. It has been found that aluminum ion implantation modifies the surface layers containing intermetallic phases of TiAl3, Ti3Al, and aluminum and titanium oxides (Al2O3, TiO2, TiO и Ti2O3). Increasing the irradiation dose does not qualitatively change the alloy phase composition, but affects the quantitative characteristics of the formed secondary phases.

Язык оригиналаАнглийский
Номер статьи110230
СостояниеОпубликовано - июл 2021

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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