High-voltage microsecond pulse generator for plasma immersion ion implantation

V. A. Vizir, V. B. Zorin, S. V. Ivanov, B. M. Kovalchuk, A. D. Maksimenko, V. I. Maniiov, G. V. Smorudov, N. G. Shubkin, V. V. Chervyakov

    Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

    1 Цитирования (Scopus)

    Аннотация

    The generator is intended to supply plasma immerse ion implanters [1], [2]. It has the following parameters: voltage pulse amplitude - (20÷60) kV, current pulse amplitude - (100÷40) A, pulse length - (5÷20) μs, leading edge length - 1 μs, decay length - 2 μs, pulse frequency - up to 1000 Hz, average power - up to 10 kW. The generator is made by the scheme of a modulator with partial capacity discharge. A high-power modulator tube GM1-29A1 (40 kV, 200 A) is used as a switch. A driver is made at a JGBT transistor. A pulse from modulator is applied by the cable to the step-up pulsed transformer placed near the implanter. The transformer has a winding switch allowing controlling the output voltage from 20 to 60 kV at a distance by 6 steps. Smooth control is realized by the power supply. The modulator has the current protection of the power supply and rapid (0.5 μs) current protection of the modulator tube. The modulator can be controlled both from the local control board and at a distance - from the computer. The generator has a load equivalent on the basis of a water resistor.The generator also can be used as an accelerating voltage power supply for charged particle beam sources.

    Язык оригиналаАнглийский
    Название основной публикацииPPPS 2001 - Pulsed Power Plasma Science 2001
    ИздательInstitute of Electrical and Electronics Engineers Inc.
    Страницы721-722
    Число страниц2
    Том1
    ISBN (печатное издание)0780371208, 9780780371200
    DOI
    СостояниеОпубликовано - 2015
    Событие28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001 - Las Vegas, Соединенные Штаты Америки
    Продолжительность: 17 июн 200122 июн 2001

    Другое

    Другое28th IEEE International Conference on Plasma Science and 13th IEEE International Pulsed Power Conference, PPPS 2001
    СтранаСоединенные Штаты Америки
    ГородLas Vegas
    Период17.6.0122.6.01

    ASJC Scopus subject areas

    • Energy Engineering and Power Technology
    • Nuclear Energy and Engineering
    • Nuclear and High Energy Physics

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  • Цитировать

    Vizir, V. A., Zorin, V. B., Ivanov, S. V., Kovalchuk, B. M., Maksimenko, A. D., Maniiov, V. I., Smorudov, G. V., Shubkin, N. G., & Chervyakov, V. V. (2015). High-voltage microsecond pulse generator for plasma immersion ion implantation. В PPPS 2001 - Pulsed Power Plasma Science 2001 (Том 1, стр. 721-722). [1002197] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PPPS.2001.01002197