Аннотация

This study describes the possibility of ultra-high dose aluminum ion implantation for surface modification of titanium. The DC vacuum arc source was used to produce dense metal plasma. Plasma immersion aluminum ions extraction and their ballistic focusing in equipotential space of negatively biased hemispherical electrode was used to obtain high intensity aluminum ion beam with the maximum amplitude of 1 A at the ion current density up to hundreds of mA/cm2. The original filtration system was used to prevent the deposition of vacuum arc aluminum macroparticles onto the irradiation area of titanium sample. Aluminum low energy ions (ion energy E < 10 keV) were implanted into titanium with the doses reaching 1021 ion/cm2. The effect of ion current density, implantation dose and substrate temperature on the phase composition, microstructure and distribution of elements was studied by X-ray diffraction, scanning electron microscopy and glow-discharge optical emission spectroscopy, respectively. The results show the appearance of Ti3Al intermetallic phase after Al implantation. The depth of aluminum penetration into titanium increases with the implantation dose and multiply exceeds the projected ranges of ions of given energies.

Язык оригиналаАнглийский
Название основной публикации2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings
РедакторыVolker Haublein, Heiner Ryssel
ИздательInstitute of Electrical and Electronics Engineers Inc.
Страницы364-367
Число страниц4
ISBN (электронное издание)9781538668283
DOI
СостояниеОпубликовано - сен 2018
Событие22nd International Conference on Ion Implantation Technology, IIT 2018 - Wurzburg, Германия
Продолжительность: 16 сен 201821 сен 2018

Серия публикаций

НазваниеProceedings of the International Conference on Ion Implantation Technology
Том2018-September

Конференция

Конференция22nd International Conference on Ion Implantation Technology, IIT 2018
СтранаГермания
ГородWurzburg
Период16.9.1821.9.18

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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  • Цитировать

    Ryabchikov, A., Shevelev, A., Sivin, D., Kashkarov, E., Bozhko, I., & Stepanov, I. (2018). High Intensity low Aluminum Ion Energy Implantation into Titanium. В V. Haublein, & H. Ryssel (Ред.), 2018 22nd International Conference on Ion Implantation Technology, IIT 2018 - Proceedings (стр. 364-367). [8807970] (Proceedings of the International Conference on Ion Implantation Technology; Том 2018-September). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IIT.2018.8807970