Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Nikolay Nikolaevich Koval, Yu F. Ivanov, I. V. Lopatin, Yu H. Akhmadeev, V. V. Shugurov, O. V. Krysina, V. V. Denisov

Результат исследований: Материалы для журналаСтатья

18 Цитирования (Scopus)

Выдержка

In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented.

Язык оригиналаАнглийский
Страницы (с-по)1326-1338
Число страниц13
ЖурналRussian Journal of General Chemistry
Том85
Номер выпуска5
DOI
СостояниеОпубликовано - 18 мая 2015

Отпечаток

Plasma Gases
Vacuum
Plasmas
Plasma sources
Chemical modification
Temperature

ASJC Scopus subject areas

  • Chemistry(all)

Цитировать

Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. / Koval, Nikolay Nikolaevich; Ivanov, Yu F.; Lopatin, I. V.; Akhmadeev, Yu H.; Shugurov, V. V.; Krysina, O. V.; Denisov, V. V.

В: Russian Journal of General Chemistry, Том 85, № 5, 18.05.2015, стр. 1326-1338.

Результат исследований: Материалы для журналаСтатья

Koval, Nikolay Nikolaevich ; Ivanov, Yu F. ; Lopatin, I. V. ; Akhmadeev, Yu H. ; Shugurov, V. V. ; Krysina, O. V. ; Denisov, V. V. / Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes. В: Russian Journal of General Chemistry. 2015 ; Том 85, № 5. стр. 1326-1338.
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