Formation of crystalline Al-Ti-O thin films and their properties

J. Musil, V. Šatava, R. Čerstvý, P. Zeman, T. Tölg

Результат исследований: Материалы для журналаСтатья

15 Цитирования (Scopus)

Выдержка

The article reports on the effect of addition of Ti into Al2O3 films with Ti on their structure, mechanical properties and oxidation resistance. The main aim of the investigation was to prepare crystalline Al-Ti-O films at substrate temperatures Ts ≤ 500 °C. The films with three different compositions (41, 43 and 67 mol% Al2O3) were reactively sputtered from a composed Al/Ti target and their properties were characterized using X-ray diffraction (XRD), X-ray fluorescent spectroscopy (XRF), microhardness testing, and thermogravimetric analysis (TGA). It was found that (1) the addition of Ti stimulates crystallization of Al-Ti-O films at lower substrate temperatures, (2) Al-Ti-O films with a nanocrystalline cubic γ-Al2O3 structure, hardness of 25 GPa and zero oxidation in a flowing air up to ∼ 1050 °C can be prepared already at low substrate temperature of 200 °C, and (3) the crystallinity of Al-Ti-O films produced at a given temperature improves with the increasing amount of Ti. The last finding is in a good agreement with the binary phase diagram of the TiO2-Al2O3 system.

Язык оригиналаАнглийский
Страницы (с-по)6064-6069
Число страниц6
ЖурналSurface and Coatings Technology
Том202
Номер выпуска24
DOI
СостояниеОпубликовано - 15 авг 2008

Отпечаток

Crystalline materials
Thin films
thin films
Substrates
Temperature
temperature
oxidation resistance
Oxidation resistance
Crystallization
Microhardness
microhardness
Phase diagrams
Thermogravimetric analysis
crystallinity
x rays
hardness
Hardness
phase diagrams
Spectroscopy
mechanical properties

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Цитировать

Formation of crystalline Al-Ti-O thin films and their properties. / Musil, J.; Šatava, V.; Čerstvý, R.; Zeman, P.; Tölg, T.

В: Surface and Coatings Technology, Том 202, № 24, 15.08.2008, стр. 6064-6069.

Результат исследований: Материалы для журналаСтатья

Musil, J, Šatava, V, Čerstvý, R, Zeman, P & Tölg, T 2008, 'Formation of crystalline Al-Ti-O thin films and their properties', Surface and Coatings Technology, том. 202, № 24, стр. 6064-6069. https://doi.org/10.1016/j.surfcoat.2008.07.012
Musil, J. ; Šatava, V. ; Čerstvý, R. ; Zeman, P. ; Tölg, T. / Formation of crystalline Al-Ti-O thin films and their properties. В: Surface and Coatings Technology. 2008 ; Том 202, № 24. стр. 6064-6069.
@article{ce09bda2367043968b744a08af52e75c,
title = "Formation of crystalline Al-Ti-O thin films and their properties",
abstract = "The article reports on the effect of addition of Ti into Al2O3 films with Ti on their structure, mechanical properties and oxidation resistance. The main aim of the investigation was to prepare crystalline Al-Ti-O films at substrate temperatures Ts ≤ 500 °C. The films with three different compositions (41, 43 and 67 mol{\%} Al2O3) were reactively sputtered from a composed Al/Ti target and their properties were characterized using X-ray diffraction (XRD), X-ray fluorescent spectroscopy (XRF), microhardness testing, and thermogravimetric analysis (TGA). It was found that (1) the addition of Ti stimulates crystallization of Al-Ti-O films at lower substrate temperatures, (2) Al-Ti-O films with a nanocrystalline cubic γ-Al2O3 structure, hardness of 25 GPa and zero oxidation in a flowing air up to ∼ 1050 °C can be prepared already at low substrate temperature of 200 °C, and (3) the crystallinity of Al-Ti-O films produced at a given temperature improves with the increasing amount of Ti. The last finding is in a good agreement with the binary phase diagram of the TiO2-Al2O3 system.",
keywords = "Al-Ti-O thin film, Crystallization, Mechanical properties, Oxidation resistance, Reactive magnetron sputtering, Structure",
author = "J. Musil and V. Šatava and R. Čerstv{\'y} and P. Zeman and T. T{\"o}lg",
year = "2008",
month = "8",
day = "15",
doi = "10.1016/j.surfcoat.2008.07.012",
language = "English",
volume = "202",
pages = "6064--6069",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "24",

}

TY - JOUR

T1 - Formation of crystalline Al-Ti-O thin films and their properties

AU - Musil, J.

AU - Šatava, V.

AU - Čerstvý, R.

AU - Zeman, P.

AU - Tölg, T.

PY - 2008/8/15

Y1 - 2008/8/15

N2 - The article reports on the effect of addition of Ti into Al2O3 films with Ti on their structure, mechanical properties and oxidation resistance. The main aim of the investigation was to prepare crystalline Al-Ti-O films at substrate temperatures Ts ≤ 500 °C. The films with three different compositions (41, 43 and 67 mol% Al2O3) were reactively sputtered from a composed Al/Ti target and their properties were characterized using X-ray diffraction (XRD), X-ray fluorescent spectroscopy (XRF), microhardness testing, and thermogravimetric analysis (TGA). It was found that (1) the addition of Ti stimulates crystallization of Al-Ti-O films at lower substrate temperatures, (2) Al-Ti-O films with a nanocrystalline cubic γ-Al2O3 structure, hardness of 25 GPa and zero oxidation in a flowing air up to ∼ 1050 °C can be prepared already at low substrate temperature of 200 °C, and (3) the crystallinity of Al-Ti-O films produced at a given temperature improves with the increasing amount of Ti. The last finding is in a good agreement with the binary phase diagram of the TiO2-Al2O3 system.

AB - The article reports on the effect of addition of Ti into Al2O3 films with Ti on their structure, mechanical properties and oxidation resistance. The main aim of the investigation was to prepare crystalline Al-Ti-O films at substrate temperatures Ts ≤ 500 °C. The films with three different compositions (41, 43 and 67 mol% Al2O3) were reactively sputtered from a composed Al/Ti target and their properties were characterized using X-ray diffraction (XRD), X-ray fluorescent spectroscopy (XRF), microhardness testing, and thermogravimetric analysis (TGA). It was found that (1) the addition of Ti stimulates crystallization of Al-Ti-O films at lower substrate temperatures, (2) Al-Ti-O films with a nanocrystalline cubic γ-Al2O3 structure, hardness of 25 GPa and zero oxidation in a flowing air up to ∼ 1050 °C can be prepared already at low substrate temperature of 200 °C, and (3) the crystallinity of Al-Ti-O films produced at a given temperature improves with the increasing amount of Ti. The last finding is in a good agreement with the binary phase diagram of the TiO2-Al2O3 system.

KW - Al-Ti-O thin film

KW - Crystallization

KW - Mechanical properties

KW - Oxidation resistance

KW - Reactive magnetron sputtering

KW - Structure

UR - http://www.scopus.com/inward/record.url?scp=50449110982&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50449110982&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2008.07.012

DO - 10.1016/j.surfcoat.2008.07.012

M3 - Article

AN - SCOPUS:50449110982

VL - 202

SP - 6064

EP - 6069

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 24

ER -