Formation of concentration profiles of implanted ions in metallic materials under polyenergetic implantation

T. V. Vakhnii, G. A. Vershinin, I. A. Bozhko, I. A. Kurzina, Yu P. Sharkeev, T. S. Grekova

Результат исследований: Материалы для журналаСтатьярецензирование

2 Цитирования (Scopus)

Аннотация

A physical and mathematical model of mass transfer in polycrystalline metallic materials under exposure to ion beams is proposed. Alongside bulk indiffusion from the irradiated surface, diffusion along the migrating extensive defects interacting with an impurity is considered. For a polyenergetic ion beam, the contribution of bulk indiffusion is presented as an integral over energy of the product of two functions; one of them describes the energy distribution of ions in a beam and the second represents the implantation profile of monoenergetic ion beam.

Язык оригиналаАнглийский
Страницы (с-по)301-304
Число страниц4
ЖурналJournal of Surface Investigation
Том2
Номер выпуска2
DOI
СостояниеОпубликовано - 1 апр 2008

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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