Explosive-emission plasma dynamics in ion diode in double-pulse mode

Результат исследований: Материалы для журналаСтатья

3 Цитирования (Scopus)

Выдержка

The results of an experimental investigation of explosive-emission plasma dynamics in an ion diode with self-magnetic insulation are presented. The investigations were accomplished at the TEMP-4M accelerator set in a mode of double pulse formation. Plasma behaviour in the anode-cathode gap was analyzed according to both the current-voltage characteristics of the diode (time resolution of 0.5 ns) and thermal imprints on a target (spatial resolution of 0.8 mm). It was shown that when plasma formation at the potential electrode was complete, and up until the second (positive) pulse, the explosive-emission plasma expanded across the anode-cathode gap with a speed of 1.30.2 cm/μs. After the voltage polarity at the potential electrode was reversed (second pulse), the plasma erosion in the anode-cathode gap (similar to the effect of a plasma opening switch) occurred. During the generation of an ion beam the size of the anode-cathode gap spacing was determined by the thickness of the plasma layer on the potential electrode and the layer thickness of the electrons drifting along the grounded electrode.

Язык оригиналаАнглийский
Страницы (с-по)698-701
Число страниц4
ЖурналPlasma Science and Technology
Том13
Номер выпуска6
DOI
СостояниеОпубликовано - дек 2011

Отпечаток

plasma dynamics
diodes
anodes
cathodes
pulses
electrodes
ions
plasma layers
electric potential
insulation
erosion
polarity
accelerators
switches
spatial resolution
ion beams
spacing
electrons

ASJC Scopus subject areas

  • Condensed Matter Physics

Цитировать

Explosive-emission plasma dynamics in ion diode in double-pulse mode. / Pushkarev, Alexander I.; Isakova, Yulia I.

В: Plasma Science and Technology, Том 13, № 6, 12.2011, стр. 698-701.

Результат исследований: Материалы для журналаСтатья

@article{07c54a00dffb4a78969d51fc54ead151,
title = "Explosive-emission plasma dynamics in ion diode in double-pulse mode",
abstract = "The results of an experimental investigation of explosive-emission plasma dynamics in an ion diode with self-magnetic insulation are presented. The investigations were accomplished at the TEMP-4M accelerator set in a mode of double pulse formation. Plasma behaviour in the anode-cathode gap was analyzed according to both the current-voltage characteristics of the diode (time resolution of 0.5 ns) and thermal imprints on a target (spatial resolution of 0.8 mm). It was shown that when plasma formation at the potential electrode was complete, and up until the second (positive) pulse, the explosive-emission plasma expanded across the anode-cathode gap with a speed of 1.30.2 cm/μs. After the voltage polarity at the potential electrode was reversed (second pulse), the plasma erosion in the anode-cathode gap (similar to the effect of a plasma opening switch) occurred. During the generation of an ion beam the size of the anode-cathode gap spacing was determined by the thickness of the plasma layer on the potential electrode and the layer thickness of the electrons drifting along the grounded electrode.",
keywords = "graphite cathodes, Ion beams, plasma speed, self-magnetic insulation",
author = "Pushkarev, {Alexander I.} and Isakova, {Yulia I.}",
year = "2011",
month = "12",
doi = "10.1088/1009-0630/13/6/12",
language = "English",
volume = "13",
pages = "698--701",
journal = "Plasma Science and Technology",
issn = "1009-0630",
publisher = "IOP Publishing Ltd.",
number = "6",

}

TY - JOUR

T1 - Explosive-emission plasma dynamics in ion diode in double-pulse mode

AU - Pushkarev, Alexander I.

AU - Isakova, Yulia I.

PY - 2011/12

Y1 - 2011/12

N2 - The results of an experimental investigation of explosive-emission plasma dynamics in an ion diode with self-magnetic insulation are presented. The investigations were accomplished at the TEMP-4M accelerator set in a mode of double pulse formation. Plasma behaviour in the anode-cathode gap was analyzed according to both the current-voltage characteristics of the diode (time resolution of 0.5 ns) and thermal imprints on a target (spatial resolution of 0.8 mm). It was shown that when plasma formation at the potential electrode was complete, and up until the second (positive) pulse, the explosive-emission plasma expanded across the anode-cathode gap with a speed of 1.30.2 cm/μs. After the voltage polarity at the potential electrode was reversed (second pulse), the plasma erosion in the anode-cathode gap (similar to the effect of a plasma opening switch) occurred. During the generation of an ion beam the size of the anode-cathode gap spacing was determined by the thickness of the plasma layer on the potential electrode and the layer thickness of the electrons drifting along the grounded electrode.

AB - The results of an experimental investigation of explosive-emission plasma dynamics in an ion diode with self-magnetic insulation are presented. The investigations were accomplished at the TEMP-4M accelerator set in a mode of double pulse formation. Plasma behaviour in the anode-cathode gap was analyzed according to both the current-voltage characteristics of the diode (time resolution of 0.5 ns) and thermal imprints on a target (spatial resolution of 0.8 mm). It was shown that when plasma formation at the potential electrode was complete, and up until the second (positive) pulse, the explosive-emission plasma expanded across the anode-cathode gap with a speed of 1.30.2 cm/μs. After the voltage polarity at the potential electrode was reversed (second pulse), the plasma erosion in the anode-cathode gap (similar to the effect of a plasma opening switch) occurred. During the generation of an ion beam the size of the anode-cathode gap spacing was determined by the thickness of the plasma layer on the potential electrode and the layer thickness of the electrons drifting along the grounded electrode.

KW - graphite cathodes

KW - Ion beams

KW - plasma speed

KW - self-magnetic insulation

UR - http://www.scopus.com/inward/record.url?scp=84855316176&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84855316176&partnerID=8YFLogxK

U2 - 10.1088/1009-0630/13/6/12

DO - 10.1088/1009-0630/13/6/12

M3 - Article

AN - SCOPUS:84855316176

VL - 13

SP - 698

EP - 701

JO - Plasma Science and Technology

JF - Plasma Science and Technology

SN - 1009-0630

IS - 6

ER -