Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

Alena V. Yuryeva, Artyom S. Shabunin, Dmitry V. Korzhenko, Olga S. Korneva, Mikhail V. Nikolaev

Научно-образовательный центр Б.П. Вейнберга

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Аннотация

The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm² is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

Язык оригинала	Английский
Страницы (с-по)	135-138
Число страниц	4
Журнал	Vacuum
Том	141
DOI	https://doi.org/10.1016/j.vacuum.2017.04.001
Состояние	Опубликовано - 1 июл 2017

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

Доступ к документу

10.1016/j.vacuum.2017.04.001

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Цитировать

Yuryeva, A. V., Shabunin, A. S., Korzhenko, D. V., Korneva, O. S., & Nikolaev, M. V. (2017). Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target. Vacuum, 141, 135-138. https://doi.org/10.1016/j.vacuum.2017.04.001

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AU - Yuryeva, Alena V.

AU - Shabunin, Artyom S.

AU - Korzhenko, Dmitry V.

AU - Korneva, Olga S.

AU - Nikolaev, Mikhail V.

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N2 - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

AB - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

KW - High-rate coating deposition

KW - Liquid-phase target

KW - Magnetron sputtering systems

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