Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

Alena V. Yuryeva, Artyom S. Shabunin, Dmitry V. Korzhenko, Olga S. Korneva, Mikhail V. Nikolaev

Научно-образовательный центр Б.П. Вейнберга

Результат исследований: Материалы для журнала › Статья › рецензирование

Аннотация

The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm² is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

Язык оригинала	Английский
Страницы (с-по)	135-138
Число страниц	4
Журнал	Vacuum
Том	141
DOI	https://doi.org/10.1016/j.vacuum.2017.04.001
Состояние	Опубликовано - 1 июл 2017

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

Доступ к документу

10.1016/j.vacuum.2017.04.001

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Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target. / Yuryeva, Alena V.; Shabunin, Artyom S.; Korzhenko, Dmitry V.; Korneva, Olga S.; Nikolaev, Mikhail V.

В: Vacuum, Том 141, 01.07.2017, стр. 135-138.

Результат исследований: Материалы для журнала › Статья › рецензирование

@article{b29be921eb7b479c897ce48904c32615,

title = "Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target",

abstract = "The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.",

keywords = "High-rate coating deposition, Liquid-phase target, Magnetron sputtering systems",

author = "Yuryeva, {Alena V.} and Shabunin, {Artyom S.} and Korzhenko, {Dmitry V.} and Korneva, {Olga S.} and Nikolaev, {Mikhail V.}",

year = "2017",

month = jul,

day = "1",

doi = "10.1016/j.vacuum.2017.04.001",

language = "English",

volume = "141",

pages = "135--138",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Limited",

}

TY - JOUR

T1 - Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target

AU - Yuryeva, Alena V.

AU - Shabunin, Artyom S.

AU - Korzhenko, Dmitry V.

AU - Korneva, Olga S.

AU - Nikolaev, Mikhail V.

PY - 2017/7/1

Y1 - 2017/7/1

N2 - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

AB - The paper presents a high-rate method for metal coating deposition by the means of magnetron sputtering system (MSS) with liquid-phase target. Maximum copper deposition rate at a power density of 55 W/cm2 is 200 nm/s, which is twenty times higher than if an ordinary magnetron is used. The effect of material of the crucible on operation of MSS with liquid-phase target and copper coating deposition rate is studied. It is demonstrated that using the crucible with a lower emissivity allows the several-fold increase in deposition rate.

KW - High-rate coating deposition

KW - Liquid-phase target

KW - Magnetron sputtering systems

UR - http://www.scopus.com/inward/record.url?scp=85017121098&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85017121098&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2017.04.001

DO - 10.1016/j.vacuum.2017.04.001

M3 - Article

AN - SCOPUS:85017121098

VL - 141

SP - 135

EP - 138

JO - Vacuum

JF - Vacuum

SN - 0042-207X

ER -