Effect of magnetic field configuration of dual magnetron on carbon based films properties

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

1 цитирование (Scopus)

Выдержка

The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures.

Язык оригиналаАнглийский
Название основной публикацииAdvanced Materials Research
ИздательTrans Tech Publications Ltd
Страницы721-725
Число страниц5
Том1040
ISBN (печатное издание)9783038352648
DOI
СостояниеОпубликовано - 2014
СобытиеInternational Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014 - Tomsk, Российская Федерация
Продолжительность: 26 мар 201428 мар 2014

Серия публикаций

НазваниеAdvanced Materials Research
Том1040
ISSN (печатное издание)10226680
ISSN (электронное издание)16628985

Другое

ДругоеInternational Conference for Young Scientists “High Technology: Research and Applications 2014”, HTRA 2014
СтранаРоссийская Федерация
ГородTomsk
Период26.3.1428.3.14

Отпечаток

Magnetic fields
Carbon
Carbon films
Auger electron spectroscopy
Deposition rates
Magnetron sputtering
Argon
Mirrors
Hardness
Impurities
Plasmas
Mechanical properties

ASJC Scopus subject areas

  • Engineering(all)

Цитировать

Yurjev, Y. N., Zaitcev, D. A., Sidelev, D. V., & Tupikova, O. S. (2014). Effect of magnetic field configuration of dual magnetron on carbon based films properties. В Advanced Materials Research (Том 1040, стр. 721-725). (Advanced Materials Research; Том 1040). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/AMR.1040.721

Effect of magnetic field configuration of dual magnetron on carbon based films properties. / Yurjev, Yuriy N.; Zaitcev, Danil A.; Sidelev, Dmitrii Vladimirovich; Tupikova, Olga Sergeevna.

Advanced Materials Research. Том 1040 Trans Tech Publications Ltd, 2014. стр. 721-725 (Advanced Materials Research; Том 1040).

Результат исследований: Материалы для книги/типы отчетовМатериалы для конференции

Yurjev, YN, Zaitcev, DA, Sidelev, DV & Tupikova, OS 2014, Effect of magnetic field configuration of dual magnetron on carbon based films properties. в Advanced Materials Research. том. 1040, Advanced Materials Research, том. 1040, Trans Tech Publications Ltd, стр. 721-725, Tomsk, Российская Федерация, 26.3.14. https://doi.org/10.4028/www.scientific.net/AMR.1040.721
Yurjev YN, Zaitcev DA, Sidelev DV, Tupikova OS. Effect of magnetic field configuration of dual magnetron on carbon based films properties. В Advanced Materials Research. Том 1040. Trans Tech Publications Ltd. 2014. стр. 721-725. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.1040.721
Yurjev, Yuriy N. ; Zaitcev, Danil A. ; Sidelev, Dmitrii Vladimirovich ; Tupikova, Olga Sergeevna. / Effect of magnetic field configuration of dual magnetron on carbon based films properties. Advanced Materials Research. Том 1040 Trans Tech Publications Ltd, 2014. стр. 721-725 (Advanced Materials Research).
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