Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition

Результат исследований: Материалы для журналаСтатья


It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.

Язык оригиналаАнглийский
Страницы (с-по)648-651
Число страниц4
ЖурналJournal of Surface Investigation
Номер выпуска3
СостояниеОпубликовано - 1 мая 2016


ASJC Scopus subject areas

  • Surfaces, Coatings and Films