Dislocation structure in near-surface layers of pure metals formed by ion implantation

A. N. Didenko, Alexander Ilyich Ryabchikov, G. P. Isaev, N. M. Arzubov, Yu P. Sharkeev, E. V. Kozlov, G. V. Pushkareva, I. V. Nikonova, A. E. Ligachev

Результат исследований: Материалы для журналаСтатьярецензирование

31 Цитирования (Scopus)


Layer-by-layer investigation of the dislocation structure in near-surface layers of pure metals affected by high-dose ion implantation (D = 1 × 1016- 1 × 1018 ions cm-2, V = 40 kV, 1.2 MV) was carried out using electron microscopy. It was established that implantation of different ions in copper and α-Fe resulted in the formation of a developed dislocation structure in the near-surface layer, the thickness of which exceeded the ion range by several orders of magnitude. The dependences of dislocation density and dislocation loop concentration have been plotted vs. the distance to the irradiated surface.

Язык оригиналаАнглийский
Страницы (с-по)337-341
Число страниц5
ЖурналMaterials Science and Engineering A
Номер выпускаC
СостояниеОпубликовано - 1 авг 1989

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

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