Язык оригиналаАнглийский
Название основной публикацииICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams
ИздательInstitute of Electrical and Electronics Engineers Inc.
ISBN (печатное издание)9781479927111
DOI
СостояниеОпубликовано - 16 янв 2015
Событие41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014 - Washington, Соединенные Штаты Америки
Продолжительность: 25 мая 201429 мая 2014

Другое

Другое41st IEEE International Conference on Plasma Science, ICOPS 2014 and the 20th IEEE International Conference on High-Power Particle Beams, BEAMS 2014
СтранаСоединенные Штаты Америки
ГородWashington
Период25.5.1429.5.14

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Condensed Matter Physics

Цитировать

Remnev, G. E., Kholodnaya, G. E., Sazonov, R. V., & Ponomarev, DV. (2015). Deposition of the silicon films from plasma ablation formed by a high power ion beam. В ICOPS/BEAMS 2014 - 41st IEEE International Conference on Plasma Science and the 20th International Conference on High-Power Particle Beams [7012575] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/PLASMA.2014.7012575